JPH0557732B2 - - Google Patents

Info

Publication number
JPH0557732B2
JPH0557732B2 JP58135396A JP13539683A JPH0557732B2 JP H0557732 B2 JPH0557732 B2 JP H0557732B2 JP 58135396 A JP58135396 A JP 58135396A JP 13539683 A JP13539683 A JP 13539683A JP H0557732 B2 JPH0557732 B2 JP H0557732B2
Authority
JP
Japan
Prior art keywords
reaction
plasma
present
fir
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58135396A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6027123A (ja
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP58135396A priority Critical patent/JPS6027123A/ja
Publication of JPS6027123A publication Critical patent/JPS6027123A/ja
Publication of JPH0557732B2 publication Critical patent/JPH0557732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/24—
    • H10P14/3411—

Landscapes

  • Formation Of Insulating Films (AREA)
  • Photovoltaic Devices (AREA)
JP58135396A 1983-07-25 1983-07-25 光プラズマ気相反応法 Granted JPS6027123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58135396A JPS6027123A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58135396A JPS6027123A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Publications (2)

Publication Number Publication Date
JPS6027123A JPS6027123A (ja) 1985-02-12
JPH0557732B2 true JPH0557732B2 (en:Method) 1993-08-24

Family

ID=15150732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58135396A Granted JPS6027123A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Country Status (1)

Country Link
JP (1) JPS6027123A (en:Method)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3017742B2 (ja) * 1988-09-13 2000-03-13 ソニー株式会社 半導体装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2214204C3 (de) * 1972-03-23 1975-12-11 Nikolaj Alexandrowitsch Michaljow Reaktor zur kontinuierlichen Polymerisation
JPS56124229A (en) * 1980-03-05 1981-09-29 Matsushita Electric Ind Co Ltd Manufacture of thin film
JPS5710920A (en) * 1980-06-23 1982-01-20 Canon Inc Film forming process

Also Published As

Publication number Publication date
JPS6027123A (ja) 1985-02-12

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