JPS6024589B2 - 相補型絶縁ゲート電界効果トランジスタの製造方法 - Google Patents
相補型絶縁ゲート電界効果トランジスタの製造方法Info
- Publication number
- JPS6024589B2 JPS6024589B2 JP49022796A JP2279674A JPS6024589B2 JP S6024589 B2 JPS6024589 B2 JP S6024589B2 JP 49022796 A JP49022796 A JP 49022796A JP 2279674 A JP2279674 A JP 2279674A JP S6024589 B2 JPS6024589 B2 JP S6024589B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- region
- forming
- source
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49022796A JPS6024589B2 (ja) | 1974-02-28 | 1974-02-28 | 相補型絶縁ゲート電界効果トランジスタの製造方法 |
US05/554,152 US3986896A (en) | 1974-02-28 | 1975-02-28 | Method of manufacturing semiconductor devices |
GB8370/75A GB1503017A (en) | 1974-02-28 | 1975-02-28 | Method of manufacturing semiconductor devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49022796A JPS6024589B2 (ja) | 1974-02-28 | 1974-02-28 | 相補型絶縁ゲート電界効果トランジスタの製造方法 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5238178A Division JPS53149777A (en) | 1978-05-02 | 1978-05-02 | Manufacture of integrated-circuit device |
JP57055304A Division JPS57197852A (en) | 1982-04-05 | 1982-04-05 | Manufacture of complementary type insulating gate field-effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50116275A JPS50116275A (enrdf_load_stackoverflow) | 1975-09-11 |
JPS6024589B2 true JPS6024589B2 (ja) | 1985-06-13 |
Family
ID=12092629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49022796A Expired JPS6024589B2 (ja) | 1974-02-28 | 1974-02-28 | 相補型絶縁ゲート電界効果トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6024589B2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60249360A (ja) * | 1984-05-24 | 1985-12-10 | Seiko Instr & Electronics Ltd | 半導体装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4917688A (enrdf_load_stackoverflow) * | 1972-06-05 | 1974-02-16 |
-
1974
- 1974-02-28 JP JP49022796A patent/JPS6024589B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS50116275A (enrdf_load_stackoverflow) | 1975-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5843556A (ja) | 相補型半導体装置の製造方法 | |
JPS6024589B2 (ja) | 相補型絶縁ゲート電界効果トランジスタの製造方法 | |
JPS6360549B2 (enrdf_load_stackoverflow) | ||
JPS61182267A (ja) | 半導体装置の製造方法 | |
JPS5874070A (ja) | 半導体装置の製造方法 | |
JPH0565063B2 (enrdf_load_stackoverflow) | ||
JPS6159539B2 (enrdf_load_stackoverflow) | ||
JPS61287160A (ja) | Mos型半導体装置の製造方法 | |
JP2610906B2 (ja) | BiMOS半導体回路装置の製造方法 | |
JPH01110761A (ja) | 半導体装置の製造方法 | |
JPS62263658A (ja) | 半導体装置およびその製造方法 | |
JPS5939901B2 (ja) | 半導体装置の製造方法 | |
JPS6410103B2 (enrdf_load_stackoverflow) | ||
JPH06252173A (ja) | 絶縁ゲート型半導体装置の製造方法 | |
JPS61166154A (ja) | Mis型半導体装置の製造方法 | |
JPH0225261B2 (enrdf_load_stackoverflow) | ||
JPS62130562A (ja) | 電界効果トランジスタの製法 | |
JPH01165162A (ja) | 半導体記憶装置の製造方法 | |
JPS60158659A (ja) | 半導体装置の製造方法 | |
JPS62160755A (ja) | 集積回路装置の製法 | |
JPS6051275B2 (ja) | 半導体装置の製造方法 | |
JPS61218161A (ja) | 半導体装置とその製造法 | |
JPH0267756A (ja) | 半導体装置 | |
JPS6020561A (ja) | Mos型半導体装置の製造方法 | |
JPH027531A (ja) | 半導体装置の製造方法 |