JPS6024343A - 金属薄膜抵抗体 - Google Patents
金属薄膜抵抗体Info
- Publication number
- JPS6024343A JPS6024343A JP58132124A JP13212483A JPS6024343A JP S6024343 A JPS6024343 A JP S6024343A JP 58132124 A JP58132124 A JP 58132124A JP 13212483 A JP13212483 A JP 13212483A JP S6024343 A JPS6024343 A JP S6024343A
- Authority
- JP
- Japan
- Prior art keywords
- resistance
- tantalum
- aluminum
- thin film
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title abstract description 7
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 19
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 18
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 17
- 239000011651 chromium Substances 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 10
- 239000002131 composite material Substances 0.000 claims 1
- 230000003340 mental effect Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 14
- 238000010586 diagram Methods 0.000 abstract description 4
- 229910000838 Al alloy Inorganic materials 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 241000209094 Oryza Species 0.000 description 2
- 235000007164 Oryza sativa Nutrition 0.000 description 2
- 210000004907 gland Anatomy 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 235000009566 rice Nutrition 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 241000208140 Acer Species 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000001467 acupuncture Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000000762 glandular Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- HWEYZGSCHQNNEH-UHFFFAOYSA-N silicon tantalum Chemical compound [Si].[Ta] HWEYZGSCHQNNEH-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Non-Adjustable Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58132124A JPS6024343A (ja) | 1983-07-20 | 1983-07-20 | 金属薄膜抵抗体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58132124A JPS6024343A (ja) | 1983-07-20 | 1983-07-20 | 金属薄膜抵抗体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6024343A true JPS6024343A (ja) | 1985-02-07 |
| JPH0331780B2 JPH0331780B2 (enrdf_load_stackoverflow) | 1991-05-08 |
Family
ID=15073966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58132124A Granted JPS6024343A (ja) | 1983-07-20 | 1983-07-20 | 金属薄膜抵抗体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6024343A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6277436A (ja) * | 1985-09-30 | 1987-04-09 | Susumu Kogyo Kk | 電気抵抗材料およびそれを用いた薄膜素子 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58153752A (ja) * | 1982-03-08 | 1983-09-12 | Takeshi Masumoto | Ｎｉ−Ｃｒ系合金材料 |
-
1983
- 1983-07-20 JP JP58132124A patent/JPS6024343A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58153752A (ja) * | 1982-03-08 | 1983-09-12 | Takeshi Masumoto | Ｎｉ−Ｃｒ系合金材料 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6277436A (ja) * | 1985-09-30 | 1987-04-09 | Susumu Kogyo Kk | 電気抵抗材料およびそれを用いた薄膜素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0331780B2 (enrdf_load_stackoverflow) | 1991-05-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4298505A (en) | Resistor composition and method of manufacture thereof | |
| JPH0821482B2 (ja) | 高安定性積層フィルム抵抗器およびその製造方法 | |
| JPH06158272A (ja) | 抵抗膜および抵抗膜の製造方法 | |
| JPS6024343A (ja) | 金属薄膜抵抗体 | |
| JPS61501784A (ja) | 歯科用合金 | |
| TWI250218B (en) | Metallic resistance material, sputtering target, resistance thin film, and method for making the resistance thin film | |
| US4971759A (en) | Metallic material for flutes | |
| JPH0412601B2 (enrdf_load_stackoverflow) | ||
| JPS6244526A (ja) | ガラス封着用合金の製造方法 | |
| JPH047561B2 (enrdf_load_stackoverflow) | ||
| US2861010A (en) | Method of bonding porcelain to gold castings and articles resulting therefrom | |
| JPS5944383B2 (ja) | シンドウゲンスイゴウキン | |
| JPH045241B2 (enrdf_load_stackoverflow) | ||
| JPS63147305A (ja) | 金属薄膜抵抗体 | |
| Schippel | Modifications test of vacuum deposition Ni/Cr films with Mn and Si for thin film resistors | |
| JPH0336257A (ja) | チタンおよびチタン合金の酸化処理方法 | |
| US1540928A (en) | Acid-resisting alloy | |
| JPS5950152A (ja) | 時計用外装部品 | |
| JPS62188753A (ja) | 軟質ガラス封着用合金 | |
| JPS6034241B2 (ja) | 薄膜抵抗体の製造方法 | |
| JPS6024563B2 (ja) | 抵抗薄膜 | |
| JPS6018124B2 (ja) | 抵抗薄膜 | |
| JPH01272735A (ja) | 耐熱および陶材焼付用合金 | |
| JPS58135688A (ja) | 磁気抵抗素子の製造方法 | |
| JPS6021360A (ja) | 軟質ガラス封着用合金 |