JPS60239028A - 表面清浄化方法 - Google Patents

表面清浄化方法

Info

Publication number
JPS60239028A
JPS60239028A JP59094023A JP9402384A JPS60239028A JP S60239028 A JPS60239028 A JP S60239028A JP 59094023 A JP59094023 A JP 59094023A JP 9402384 A JP9402384 A JP 9402384A JP S60239028 A JPS60239028 A JP S60239028A
Authority
JP
Japan
Prior art keywords
hydrogen peroxide
silicon
solution
substrate
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59094023A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0473613B2 (enExample
Inventor
Toru Tatsumi
徹 辰巳
Hisaaki Aizaki
尚昭 相崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP59094023A priority Critical patent/JPS60239028A/ja
Publication of JPS60239028A publication Critical patent/JPS60239028A/ja
Publication of JPH0473613B2 publication Critical patent/JPH0473613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P70/15—

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP59094023A 1984-05-11 1984-05-11 表面清浄化方法 Granted JPS60239028A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59094023A JPS60239028A (ja) 1984-05-11 1984-05-11 表面清浄化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59094023A JPS60239028A (ja) 1984-05-11 1984-05-11 表面清浄化方法

Publications (2)

Publication Number Publication Date
JPS60239028A true JPS60239028A (ja) 1985-11-27
JPH0473613B2 JPH0473613B2 (enExample) 1992-11-24

Family

ID=14098959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59094023A Granted JPS60239028A (ja) 1984-05-11 1984-05-11 表面清浄化方法

Country Status (1)

Country Link
JP (1) JPS60239028A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH023920A (ja) * 1988-01-25 1990-01-09 Intel Corp エッチング方法
JPH0281429A (ja) * 1988-09-16 1990-03-22 Sony Corp シリコンのエッチング方法
JPH02207526A (ja) * 1989-02-07 1990-08-17 Tokyo Electron Ltd 枚葉式洗浄装置及び洗浄方法
EP0924970A3 (en) * 1997-12-22 2000-03-08 Kurita Water Industries Ltd. Cleaning solution for electronic materials and method for using the same
US6431183B1 (en) 1997-10-09 2002-08-13 Mitsubishi Denki Kabushiki Kaisha Method for treating semiconductor substrates
JP2010056416A (ja) * 2008-08-29 2010-03-11 Shin-Etsu Chemical Co Ltd ハイブリッド基板の洗浄方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434751A (en) * 1977-08-24 1979-03-14 Hitachi Ltd Washing method for silicon wafer
JPS57180132A (en) * 1981-04-30 1982-11-06 Fujitsu Ltd Washing method of substrate
JPS57204132A (en) * 1981-06-10 1982-12-14 Fujitsu Ltd Washing method for silicon wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434751A (en) * 1977-08-24 1979-03-14 Hitachi Ltd Washing method for silicon wafer
JPS57180132A (en) * 1981-04-30 1982-11-06 Fujitsu Ltd Washing method of substrate
JPS57204132A (en) * 1981-06-10 1982-12-14 Fujitsu Ltd Washing method for silicon wafer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH023920A (ja) * 1988-01-25 1990-01-09 Intel Corp エッチング方法
JPH0281429A (ja) * 1988-09-16 1990-03-22 Sony Corp シリコンのエッチング方法
JPH02207526A (ja) * 1989-02-07 1990-08-17 Tokyo Electron Ltd 枚葉式洗浄装置及び洗浄方法
US6431183B1 (en) 1997-10-09 2002-08-13 Mitsubishi Denki Kabushiki Kaisha Method for treating semiconductor substrates
EP0924970A3 (en) * 1997-12-22 2000-03-08 Kurita Water Industries Ltd. Cleaning solution for electronic materials and method for using the same
US6372699B1 (en) 1997-12-22 2002-04-16 Kurita Water Industries Ltd. Cleaning solution for electronic materials and method for using same
KR100319119B1 (ko) * 1997-12-22 2002-06-20 타케토시 카즈오 전자재료용세정수
JP2010056416A (ja) * 2008-08-29 2010-03-11 Shin-Etsu Chemical Co Ltd ハイブリッド基板の洗浄方法

Also Published As

Publication number Publication date
JPH0473613B2 (enExample) 1992-11-24

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