JPS60237450A - 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 - Google Patents

非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法

Info

Publication number
JPS60237450A
JPS60237450A JP59092992A JP9299284A JPS60237450A JP S60237450 A JPS60237450 A JP S60237450A JP 59092992 A JP59092992 A JP 59092992A JP 9299284 A JP9299284 A JP 9299284A JP S60237450 A JPS60237450 A JP S60237450A
Authority
JP
Japan
Prior art keywords
layer
outermost
light
nitrocellulose
reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59092992A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6322576B2 (enrdf_load_html_response
Inventor
Yasunori Fukumitsu
福光　保典
Mitsuo Kono
河野　満男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Priority to JP59092992A priority Critical patent/JPS60237450A/ja
Publication of JPS60237450A publication Critical patent/JPS60237450A/ja
Publication of JPS6322576B2 publication Critical patent/JPS6322576B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
JP59092992A 1984-05-11 1984-05-11 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 Granted JPS60237450A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59092992A JPS60237450A (ja) 1984-05-11 1984-05-11 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59092992A JPS60237450A (ja) 1984-05-11 1984-05-11 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法

Publications (2)

Publication Number Publication Date
JPS60237450A true JPS60237450A (ja) 1985-11-26
JPS6322576B2 JPS6322576B2 (enrdf_load_html_response) 1988-05-12

Family

ID=14069859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59092992A Granted JPS60237450A (ja) 1984-05-11 1984-05-11 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法

Country Status (1)

Country Link
JP (1) JPS60237450A (enrdf_load_html_response)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62127801A (ja) * 1985-11-27 1987-06-10 ユン−ツアイ、イエン 反射防止被膜を有する複合光学用素子
JPS62149044U (enrdf_load_html_response) * 1986-03-14 1987-09-21
JPS62149043U (enrdf_load_html_response) * 1986-03-14 1987-09-21
JPS635344A (ja) * 1986-06-25 1988-01-11 Daicel Chem Ind Ltd 反射防止コ−テツドペリクルの製法
JPH02158734A (ja) * 1988-12-13 1990-06-19 Mitsui Petrochem Ind Ltd 高光線透過性防塵体の製造方法
US4996106A (en) * 1987-11-05 1991-02-26 Mitsui Petrochemical Industries, Ltd. Pellicle
US5061024A (en) * 1989-09-06 1991-10-29 E. I. Du Pont De Nemours And Company Amorphous fluoropolymer pellicle films
US5246767A (en) * 1988-12-13 1993-09-21 Mitsui Petrochemical Industries, Ltd. High light-transmissive dust-proof body and method of preparing same
US6926952B1 (en) 1998-01-13 2005-08-09 3M Innovative Properties Company Anti-reflective polymer constructions and method for producing same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846301A (ja) * 1981-09-14 1983-03-17 Toray Ind Inc 反射防止膜を有する透明材料

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846301A (ja) * 1981-09-14 1983-03-17 Toray Ind Inc 反射防止膜を有する透明材料

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62127801A (ja) * 1985-11-27 1987-06-10 ユン−ツアイ、イエン 反射防止被膜を有する複合光学用素子
JPS62149044U (enrdf_load_html_response) * 1986-03-14 1987-09-21
JPS62149043U (enrdf_load_html_response) * 1986-03-14 1987-09-21
JPS635344A (ja) * 1986-06-25 1988-01-11 Daicel Chem Ind Ltd 反射防止コ−テツドペリクルの製法
US4996106A (en) * 1987-11-05 1991-02-26 Mitsui Petrochemical Industries, Ltd. Pellicle
JPH02158734A (ja) * 1988-12-13 1990-06-19 Mitsui Petrochem Ind Ltd 高光線透過性防塵体の製造方法
US5246767A (en) * 1988-12-13 1993-09-21 Mitsui Petrochemical Industries, Ltd. High light-transmissive dust-proof body and method of preparing same
US5061024A (en) * 1989-09-06 1991-10-29 E. I. Du Pont De Nemours And Company Amorphous fluoropolymer pellicle films
US6926952B1 (en) 1998-01-13 2005-08-09 3M Innovative Properties Company Anti-reflective polymer constructions and method for producing same

Also Published As

Publication number Publication date
JPS6322576B2 (enrdf_load_html_response) 1988-05-12

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