JPS60235790A - 半絶縁性GaAs単結晶の成長方法 - Google Patents

半絶縁性GaAs単結晶の成長方法

Info

Publication number
JPS60235790A
JPS60235790A JP8967684A JP8967684A JPS60235790A JP S60235790 A JPS60235790 A JP S60235790A JP 8967684 A JP8967684 A JP 8967684A JP 8967684 A JP8967684 A JP 8967684A JP S60235790 A JPS60235790 A JP S60235790A
Authority
JP
Japan
Prior art keywords
gaas
single crystal
crystal
concentration
melt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8967684A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0569798B2 (enrdf_load_stackoverflow
Inventor
Tsutomu Tsuji
辻 力
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8967684A priority Critical patent/JPS60235790A/ja
Publication of JPS60235790A publication Critical patent/JPS60235790A/ja
Publication of JPH0569798B2 publication Critical patent/JPH0569798B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP8967684A 1984-05-04 1984-05-04 半絶縁性GaAs単結晶の成長方法 Granted JPS60235790A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8967684A JPS60235790A (ja) 1984-05-04 1984-05-04 半絶縁性GaAs単結晶の成長方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8967684A JPS60235790A (ja) 1984-05-04 1984-05-04 半絶縁性GaAs単結晶の成長方法

Publications (2)

Publication Number Publication Date
JPS60235790A true JPS60235790A (ja) 1985-11-22
JPH0569798B2 JPH0569798B2 (enrdf_load_stackoverflow) 1993-10-01

Family

ID=13977352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8967684A Granted JPS60235790A (ja) 1984-05-04 1984-05-04 半絶縁性GaAs単結晶の成長方法

Country Status (1)

Country Link
JP (1) JPS60235790A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0569798B2 (enrdf_load_stackoverflow) 1993-10-01

Similar Documents

Publication Publication Date Title
Silvey et al. The preparation and properties of some II–V semiconducting compounds
JPS60235790A (ja) 半絶縁性GaAs単結晶の成長方法
JPH10259100A (ja) GaAs単結晶の製造方法
JPH0234597A (ja) 水平ブリッジマン法によるGaAs単結晶の成長方法
JPH11268998A (ja) GaAs単結晶インゴットおよびその製造方法ならびにそれを用いたGaAs単結晶ウエハ
JPS61201700A (ja) 高抵抗GaAs結晶およびその製造方法
JPH0557240B2 (enrdf_load_stackoverflow)
JP2002255697A (ja) ガリウム砒素単結晶及びガリウム砒素ウェハ並びにガリウム砒素単結晶の製造方法
JP2736343B2 (ja) 半絶縁性InP単結晶の製造方法
Ciszek Synthesis and crystal growth of copper indium diselenide from the melt
JP3937700B2 (ja) 導電性不純物をドープしたGaAs半導体単結晶製造方法
JPH02239195A (ja) 半絶縁性3―5族化合物半導体単結晶の製造方法
KR950003430B1 (ko) 더블-도우핑(double-doping)에 의한 p-type GaAs 단결정 성장방법
JPH0524117B2 (enrdf_load_stackoverflow)
JPH08758B2 (ja) クロムドープ半絶縁性ガリウム・ヒ素単結晶の製造方法
JP3945073B2 (ja) 単結晶製造方法
JPS6270298A (ja) リン化インジウム単結晶の製造方法
JPH0317799B2 (enrdf_load_stackoverflow)
KR960014956B1 (ko) 갈륨비소 단결정 성장시의 쌍정 방지방법
JPH08756B2 (ja) 無機化合物単結晶の成長方法
JPH0772120B2 (ja) Crドープ半絶縁性砒化ガリウム結晶の製造方法
JPS6051687A (ja) 高比抵抗砒化ガリウム半導体結晶の製造方法
JPS60231500A (ja) 半絶縁性GaAs単結晶の成長方法
JPS60235789A (ja) 半絶縁性GaAs単結晶の成長方法
CN114808131A (zh) 一种GaAs单晶及其VGF制备方法