JPS60206192A - 薄膜ハイブリツド回路およびその製造方法 - Google Patents
薄膜ハイブリツド回路およびその製造方法Info
- Publication number
- JPS60206192A JPS60206192A JP60040973A JP4097385A JPS60206192A JP S60206192 A JPS60206192 A JP S60206192A JP 60040973 A JP60040973 A JP 60040973A JP 4097385 A JP4097385 A JP 4097385A JP S60206192 A JPS60206192 A JP S60206192A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- contact surface
- hybrid circuit
- inorganic protective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H10W74/137—
-
- H10W74/147—
-
- H10W74/43—
-
- H10W90/00—
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/017—Glass ceramic coating, e.g. formed on inorganic substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0302—Properties and characteristics in general
- H05K2201/0317—Thin film conductor layer; Thin film passive component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0585—Second resist used as mask for selective stripping of first resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3407784.7 | 1984-03-02 | ||
| DE19843407784 DE3407784A1 (de) | 1984-03-02 | 1984-03-02 | Duennschichthybridschaltung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60206192A true JPS60206192A (ja) | 1985-10-17 |
Family
ID=6229455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60040973A Pending JPS60206192A (ja) | 1984-03-02 | 1985-03-01 | 薄膜ハイブリツド回路およびその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0153650B1 (enExample) |
| JP (1) | JPS60206192A (enExample) |
| DE (1) | DE3407784A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0340486A (ja) * | 1989-07-07 | 1991-02-21 | Asahi Chem Ind Co Ltd | 印刷配線基板 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3735959A1 (de) * | 1987-10-23 | 1989-05-03 | Bbc Brown Boveri & Cie | Mehrlagige duennschichtschaltung sowie verfahren zu deren herstellung |
| RU2133523C1 (ru) * | 1997-11-03 | 1999-07-20 | Закрытое акционерное общество "Техно-ТМ" | Трехмерный электронный модуль |
| DE10241589B4 (de) | 2002-09-05 | 2007-11-22 | Qimonda Ag | Verfahren zur Lötstopp-Strukturierung von Erhebungen auf Wafern |
| DE10320561B4 (de) * | 2003-05-07 | 2007-12-06 | Qimonda Ag | Verfahren zur Herstellung einer leitfähigen Verbindung zwischen einem Halbleiterchip und einer äußeren Leiterstruktur |
| JP4652179B2 (ja) | 2005-09-05 | 2011-03-16 | 日東電工株式会社 | 配線回路基板 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4001870A (en) * | 1972-08-18 | 1977-01-04 | Hitachi, Ltd. | Isolating protective film for semiconductor devices and method for making the same |
| JPS49100970A (enExample) * | 1973-01-22 | 1974-09-24 | ||
| DE2548060C2 (de) * | 1975-10-27 | 1984-06-20 | Siemens AG, 1000 Berlin und 8000 München | Halbleitervorrichtung und Verfahren zu ihrer Herstellung |
| JPS52132397A (en) * | 1976-04-30 | 1977-11-07 | Nippon Chemical Ind | Thinnfilm resistor whose resistive temperature coefficient has been improved |
| US4275407A (en) * | 1977-09-01 | 1981-06-23 | Honeywell Inc. | Durable insulating protective layer for hybrid CCD/mosaic IR detector array |
| DE2823881C3 (de) * | 1978-05-31 | 1982-03-18 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung von elektrischen Dünnschichtschaltungen für die Herstellung integrierter Leiterbahnüberkreuzungen |
| GB2046024B (en) * | 1979-03-30 | 1983-01-26 | Ferranti Ltd | Circuit assembly |
-
1984
- 1984-03-02 DE DE19843407784 patent/DE3407784A1/de active Granted
-
1985
- 1985-02-12 EP EP85101472A patent/EP0153650B1/de not_active Expired
- 1985-03-01 JP JP60040973A patent/JPS60206192A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0340486A (ja) * | 1989-07-07 | 1991-02-21 | Asahi Chem Ind Co Ltd | 印刷配線基板 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0153650B1 (de) | 1989-11-08 |
| EP0153650A2 (de) | 1985-09-04 |
| DE3407784C2 (enExample) | 1988-11-10 |
| DE3407784A1 (de) | 1985-09-12 |
| EP0153650A3 (en) | 1986-11-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4001870A (en) | Isolating protective film for semiconductor devices and method for making the same | |
| US4152195A (en) | Method of improving the adherence of metallic conductive lines on polyimide layers | |
| US4045594A (en) | Planar insulation of conductive patterns by chemical vapor deposition and sputtering | |
| US4088490A (en) | Single level masking process with two positive photoresist layers | |
| US3345210A (en) | Method of applying an ohmic contact to thin film passivated resistors | |
| US4118595A (en) | Crossovers and method of fabrication | |
| JPS59123255A (ja) | 複層フレキシブル・フイルム・モジユ−ル及びその製法 | |
| JPS60206192A (ja) | 薄膜ハイブリツド回路およびその製造方法 | |
| JPH0362927A (ja) | 半導体装置およびその製造方法 | |
| JPH09214141A (ja) | 配線構造 | |
| JP2752305B2 (ja) | 回路基板 | |
| JPS6331939B2 (enExample) | ||
| US4539434A (en) | Film-type electrical substrate circuit device and method of forming the device | |
| JPH038581B2 (enExample) | ||
| JP4193314B2 (ja) | 半導体装置の製造方法 | |
| JPH10308397A (ja) | 電極端子及びその製造方法 | |
| JP3570183B2 (ja) | 半導体装置の製造方法 | |
| JPH02267941A (ja) | 突起電極の形成方法 | |
| JPS6125219B2 (enExample) | ||
| KR100206896B1 (ko) | 바이폴라 소자의 컨택형성 방법 | |
| JPH04196434A (ja) | 半導体装置の製造方法 | |
| JPS6329951A (ja) | 微細配線パタ−ン形成法 | |
| JPH0752738B2 (ja) | 半導体素子のマウント方法 | |
| JPS63160388A (ja) | 磁気抵抗素子の製造方法 | |
| JPH0246463A (ja) | 半導体装置の製造方法 |