JPS60202936A - 光学装置に用いる輻射線源 - Google Patents

光学装置に用いる輻射線源

Info

Publication number
JPS60202936A
JPS60202936A JP59229035A JP22903584A JPS60202936A JP S60202936 A JPS60202936 A JP S60202936A JP 59229035 A JP59229035 A JP 59229035A JP 22903584 A JP22903584 A JP 22903584A JP S60202936 A JPS60202936 A JP S60202936A
Authority
JP
Japan
Prior art keywords
radiation
plasma
laser
radiation source
launch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59229035A
Other languages
English (en)
Japanese (ja)
Inventor
ワルター・ゲルトナー
ウルフガング・レトシユケ
クラウス・ギユンター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of JPS60202936A publication Critical patent/JPS60202936A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/23—Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Plasma Technology (AREA)
JP59229035A 1983-11-01 1984-11-01 光学装置に用いる輻射線源 Pending JPS60202936A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD05H/2561797 1983-11-01
DD83256179A DD243629A3 (de) 1983-11-01 1983-11-01 Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme

Publications (1)

Publication Number Publication Date
JPS60202936A true JPS60202936A (ja) 1985-10-14

Family

ID=5551519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59229035A Pending JPS60202936A (ja) 1983-11-01 1984-11-01 光学装置に用いる輻射線源

Country Status (5)

Country Link
JP (1) JPS60202936A (fr)
CH (1) CH666776A5 (fr)
DD (1) DD243629A3 (fr)
FR (1) FR2554302A1 (fr)
NL (1) NL8403294A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014521991A (ja) * 2011-06-29 2014-08-28 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための適応光学系
JP2017522688A (ja) * 2014-05-15 2017-08-10 エクセリタス テクノロジーズ コーポレイション レーザ駆動シールドビームランプ
JP2018517245A (ja) * 2015-05-14 2018-06-28 エクセリタス テクノロジーズ コーポレイション 無電極単一ｃｗレーザ駆動キセノンランプ
US10497555B2 (en) 2015-05-14 2019-12-03 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10504714B2 (en) 2014-05-15 2019-12-10 Excelitas Technologies Corp. Dual parabolic laser driven sealed beam lamp

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8525138B2 (en) 2006-03-31 2013-09-03 Energetiq Technology, Inc. Laser-driven light source
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
US9814126B2 (en) 2013-10-17 2017-11-07 Asml Netherlands B.V. Photon source, metrology apparatus, lithographic system and device manufacturing method
JP6023355B2 (ja) 2013-12-06 2016-11-09 浜松ホトニクス株式会社 発光封体
US9646816B2 (en) 2013-12-06 2017-05-09 Hamamatsu Photonics K.K. Light source device
WO2015086258A1 (fr) * 2013-12-13 2015-06-18 Asml Netherlands B.V. Source de rayonnement, appareil de métrologie, système lithographique et procédé de fabrication de dispositifs
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
JP6885636B1 (ja) 2020-03-05 2021-06-16 アールアンドディー−イーサン，リミテッド レーザ励起プラズマ光源およびプラズマ点火方法
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4348105A (en) * 1981-04-30 1982-09-07 Rca Corporation Radiation shadow projection exposure system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014521991A (ja) * 2011-06-29 2014-08-28 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための適応光学系
JP2018112758A (ja) * 2011-06-29 2018-07-19 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための装置及び方法
JP2017522688A (ja) * 2014-05-15 2017-08-10 エクセリタス テクノロジーズ コーポレイション レーザ駆動シールドビームランプ
US10504714B2 (en) 2014-05-15 2019-12-10 Excelitas Technologies Corp. Dual parabolic laser driven sealed beam lamp
JP2018517245A (ja) * 2015-05-14 2018-06-28 エクセリタス テクノロジーズ コーポレイション 無電極単一ｃｗレーザ駆動キセノンランプ
US10497555B2 (en) 2015-05-14 2019-12-03 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability

Also Published As

Publication number Publication date
CH666776A5 (de) 1988-08-15
DD243629A3 (de) 1987-03-11
NL8403294A (nl) 1985-06-03
FR2554302A1 (fr) 1985-05-03

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