DD243629A3 - Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme - Google Patents
Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme Download PDFInfo
- Publication number
- DD243629A3 DD243629A3 DD83256179A DD25617983A DD243629A3 DD 243629 A3 DD243629 A3 DD 243629A3 DD 83256179 A DD83256179 A DD 83256179A DD 25617983 A DD25617983 A DD 25617983A DD 243629 A3 DD243629 A3 DD 243629A3
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- radiation
- vessel
- radiation source
- laser
- item
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/23—Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Theoretical Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electromagnetism (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Plasma Technology (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD83256179A DD243629A3 (de) | 1983-11-01 | 1983-11-01 | Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme |
FR8416445A FR2554302A1 (fr) | 1983-11-01 | 1984-10-26 | Source de rayonnement pour appareils d'optique, notamment pour systemes de reproduction par photolithographie |
NL8403294A NL8403294A (nl) | 1983-11-01 | 1984-10-30 | Stralingsbron voor optische apparaten, in het bijzonder voor fotolithografische afbeeldingssystemen. |
CH5212/84A CH666776A5 (de) | 1983-11-01 | 1984-10-31 | Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme. |
JP59229035A JPS60202936A (ja) | 1983-11-01 | 1984-11-01 | 光学装置に用いる輻射線源 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD83256179A DD243629A3 (de) | 1983-11-01 | 1983-11-01 | Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme |
Publications (1)
Publication Number | Publication Date |
---|---|
DD243629A3 true DD243629A3 (de) | 1987-03-11 |
Family
ID=5551519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD83256179A DD243629A3 (de) | 1983-11-01 | 1983-11-01 | Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS60202936A (fr) |
CH (1) | CH666776A5 (fr) |
DD (1) | DD243629A3 (fr) |
FR (1) | FR2554302A1 (fr) |
NL (1) | NL8403294A (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10008378B2 (en) | 2015-05-14 | 2018-06-26 | Excelitas Technologies Corp. | Laser driven sealed beam lamp with improved stability |
US10057973B2 (en) | 2015-05-14 | 2018-08-21 | Excelitas Technologies Corp. | Electrodeless single low power CW laser driven plasma lamp |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8525138B2 (en) | 2006-03-31 | 2013-09-03 | Energetiq Technology, Inc. | Laser-driven light source |
US9097577B2 (en) * | 2011-06-29 | 2015-08-04 | KLA—Tencor Corporation | Adaptive optics for compensating aberrations in light-sustained plasma cells |
IL234729B (en) | 2013-09-20 | 2021-02-28 | Asml Netherlands Bv | A light source operated by a laser and a method using a mode mixer |
IL234727B (en) | 2013-09-20 | 2020-09-30 | Asml Netherlands Bv | A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned |
NL2013513A (en) | 2013-10-17 | 2015-04-20 | Asml Netherlands Bv | Photon source, metrology apparatus, lithographic system and device manufacturing method. |
DE112014005518T5 (de) | 2013-12-06 | 2016-08-18 | Hamamatsu Photonics K.K. | Lichtquellenvorrichtung |
DE112014005524T5 (de) | 2013-12-06 | 2016-08-18 | Hamamatsu Photonics K.K. | Lichtemittierender, abgedichteter Körper |
KR101953712B1 (ko) | 2013-12-13 | 2019-05-17 | 에이에스엠엘 네델란즈 비.브이. | 방사선 소스, 계측 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
EP3143638B1 (fr) | 2014-05-15 | 2018-11-14 | Excelitas Technologies Corp. | Lampe monobloc à laser |
US10186416B2 (en) | 2014-05-15 | 2019-01-22 | Excelitas Technologies Corp. | Apparatus and a method for operating a variable pressure sealed beam lamp |
US9741553B2 (en) | 2014-05-15 | 2017-08-22 | Excelitas Technologies Corp. | Elliptical and dual parabolic laser driven sealed beam lamps |
US9576785B2 (en) * | 2015-05-14 | 2017-02-21 | Excelitas Technologies Corp. | Electrodeless single CW laser driven xenon lamp |
US10109473B1 (en) | 2018-01-26 | 2018-10-23 | Excelitas Technologies Corp. | Mechanically sealed tube for laser sustained plasma lamp and production method for same |
JP6885636B1 (ja) | 2020-03-05 | 2021-06-16 | アールアンドディー−イーサン,リミテッド | レーザ励起プラズマ光源およびプラズマ点火方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4348105A (en) * | 1981-04-30 | 1982-09-07 | Rca Corporation | Radiation shadow projection exposure system |
-
1983
- 1983-11-01 DD DD83256179A patent/DD243629A3/de not_active IP Right Cessation
-
1984
- 1984-10-26 FR FR8416445A patent/FR2554302A1/fr active Pending
- 1984-10-30 NL NL8403294A patent/NL8403294A/nl not_active Application Discontinuation
- 1984-10-31 CH CH5212/84A patent/CH666776A5/de not_active IP Right Cessation
- 1984-11-01 JP JP59229035A patent/JPS60202936A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10008378B2 (en) | 2015-05-14 | 2018-06-26 | Excelitas Technologies Corp. | Laser driven sealed beam lamp with improved stability |
US10057973B2 (en) | 2015-05-14 | 2018-08-21 | Excelitas Technologies Corp. | Electrodeless single low power CW laser driven plasma lamp |
Also Published As
Publication number | Publication date |
---|---|
NL8403294A (nl) | 1985-06-03 |
FR2554302A1 (fr) | 1985-05-03 |
CH666776A5 (de) | 1988-08-15 |
JPS60202936A (ja) | 1985-10-14 |
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ENJ | Ceased due to non-payment of renewal fee |