CH666776A5 - Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme. - Google Patents

Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme. Download PDF

Info

Publication number
CH666776A5
CH666776A5 CH5212/84A CH521284A CH666776A5 CH 666776 A5 CH666776 A5 CH 666776A5 CH 5212/84 A CH5212/84 A CH 5212/84A CH 521284 A CH521284 A CH 521284A CH 666776 A5 CH666776 A5 CH 666776A5
Authority
CH
Switzerland
Prior art keywords
radiation
vessel
radiation source
source according
laser
Prior art date
Application number
CH5212/84A
Other languages
German (de)
English (en)
Inventor
Walter Gaertner
Wolfgang Retschke
Klaus Guenther
Original Assignee
Zeiss Jena Veb Carl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Jena Veb Carl filed Critical Zeiss Jena Veb Carl
Publication of CH666776A5 publication Critical patent/CH666776A5/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/23—Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Plasma Technology (AREA)
CH5212/84A 1983-11-01 1984-10-31 Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme. CH666776A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD83256179A DD243629A3 (de) 1983-11-01 1983-11-01 Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme

Publications (1)

Publication Number Publication Date
CH666776A5 true CH666776A5 (de) 1988-08-15

Family

ID=5551519

Family Applications (1)

Application Number Title Priority Date Filing Date
CH5212/84A CH666776A5 (de) 1983-11-01 1984-10-31 Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme.

Country Status (5)

Country Link
JP (1) JPS60202936A (fr)
CH (1) CH666776A5 (fr)
DD (1) DD243629A3 (fr)
FR (1) FR2554302A1 (fr)
NL (1) NL8403294A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015086258A1 (fr) * 2013-12-13 2015-06-18 Asml Netherlands B.V. Source de rayonnement, appareil de métrologie, système lithographique et procédé de fabrication de dispositifs

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011100322A2 (fr) 2010-02-09 2011-08-18 Energetiq Technology, Inc. Source lumineuse commandée par laser
US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
NL2013513A (en) 2013-10-17 2015-04-20 Asml Netherlands Bv Photon source, metrology apparatus, lithographic system and device manufacturing method.
US9646816B2 (en) 2013-12-06 2017-05-09 Hamamatsu Photonics K.K. Light source device
US9984865B2 (en) 2013-12-06 2018-05-29 Hamamatsu Photonics K.K. Light-emitting sealed body
EP3457429B1 (fr) * 2014-05-15 2023-11-08 Excelitas Technologies Corp. Lampe étanche à pression réglable commandée par un laser
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US9576785B2 (en) * 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
JP6885636B1 (ja) 2020-03-05 2021-06-16 アールアンドディー−イーサン，リミテッド レーザ励起プラズマ光源およびプラズマ点火方法
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4348105A (en) * 1981-04-30 1982-09-07 Rca Corporation Radiation shadow projection exposure system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015086258A1 (fr) * 2013-12-13 2015-06-18 Asml Netherlands B.V. Source de rayonnement, appareil de métrologie, système lithographique et procédé de fabrication de dispositifs
US9924585B2 (en) 2013-12-13 2018-03-20 Asml Netherlands B.V. Radiation source, metrology apparatus, lithographic system and device manufacturing method
US10420197B2 (en) 2013-12-13 2019-09-17 Asml Netherlands B.V. Radiation source, metrology apparatus, lithographic system and device manufacturing method

Also Published As

Publication number Publication date
JPS60202936A (ja) 1985-10-14
FR2554302A1 (fr) 1985-05-03
NL8403294A (nl) 1985-06-03
DD243629A3 (de) 1987-03-11

Similar Documents

Publication Publication Date Title
CH666776A5 (de) Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme.
DE112007003819B4 (de) Lasergetriebene Lichtquelle
DE112014001493B4 (de) Plasmazelle zur Steuerung von Konvektion sowie Verfahren und System zur Steuerung von Konvektion in einer Plasmazelle
DE60218690T2 (de) Blitztempering
DE112014001747B4 (de) Verfahren und Vorrichtung zur Steuerung einer Konvektionsströmung in einem lichtgestützten Plasma
DE60303882T2 (de) Kontaminationsschutz mit ausdehnbaren Lamellen
DE112015001623B4 (de) Lasergestützte Plasma-Lichtquelle mit optischen Elementen zum Richten einer Pumpbeleuchtung, so dass eine Vielzahl voneinander räumlich getrennter Plasmen aufrecht erhalten wird und entsprechendes Verfahren für langgestreckte Plasmen
DE19758739B4 (de) Bestrahlungsvorrichtung
DE2622993A1 (de) Uv-lampen-anordnung
DE69711653T2 (de) Röntgergenerator
DE102005031792A1 (de) Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür
DE10153204A1 (de) Ultraviolettlampensystem und Verfahren
DE69611697T2 (de) Verfahren zum aktivieren von photoinitiatoren in lichtempfindlichen substraten und vorrichtung zur aushärtung solcher substrate
DE10306150B4 (de) Gepulster Sonnensimulator mit verbesserter Homogenität
DE102011113521A1 (de) Mikrolithographische Projektionsbelichtungsanlage
DE112014005636T5 (de) Plasmazelle mit freiem Flansch
DE112015001498T5 (de) Offene Plasmalampe zur Bildung eines mittels Licht aufrechterhaltenen Plasmas
DE69905456T2 (de) Mikrowellen-plasmalichtquelle
DE69309399T2 (de) Cadmium/Edelgase Entladungslampe vom Kurzbogen-Typ, und Projektions-Belichtungsvorrichtung unter Verwendung derselbe
DE102019205251A1 (de) Projektionsbelichtungsanlage mit einer Heizvorrichtung
DE102005044141B4 (de) Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
DE10205189A1 (de) Verfahren zur Erzeugung von extrem ultravioletter Strahlung auf Basis eines strahlungsemittierenden Plasmas
DE102006055738B4 (de) Vorrichtung zum Verändern des Strahldurchmessers eines durch ein optisches Element hindurchgehenden Laserstrahls mittels Temperaturänderung
Vogt et al. Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography
US6563907B1 (en) Radiation source with shaped emission

Legal Events

Date Code Title Description
PL Patent ceased