NL8403294A - Stralingsbron voor optische apparaten, in het bijzonder voor fotolithografische afbeeldingssystemen. - Google Patents

Stralingsbron voor optische apparaten, in het bijzonder voor fotolithografische afbeeldingssystemen. Download PDF

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Publication number
NL8403294A
NL8403294A NL8403294A NL8403294A NL8403294A NL 8403294 A NL8403294 A NL 8403294A NL 8403294 A NL8403294 A NL 8403294A NL 8403294 A NL8403294 A NL 8403294A NL 8403294 A NL8403294 A NL 8403294A
Authority
NL
Netherlands
Prior art keywords
vessel
radiation
radiation source
laser
plasma
Prior art date
Application number
NL8403294A
Other languages
English (en)
Dutch (nl)
Original Assignee
Jenoptik Jena Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenoptik Jena Gmbh filed Critical Jenoptik Jena Gmbh
Publication of NL8403294A publication Critical patent/NL8403294A/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/23—Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Plasma Technology (AREA)
NL8403294A 1983-11-01 1984-10-30 Stralingsbron voor optische apparaten, in het bijzonder voor fotolithografische afbeeldingssystemen. NL8403294A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD25617983 1983-11-01
DD83256179A DD243629A3 (de) 1983-11-01 1983-11-01 Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme

Publications (1)

Publication Number Publication Date
NL8403294A true NL8403294A (nl) 1985-06-03

Family

ID=5551519

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8403294A NL8403294A (nl) 1983-11-01 1984-10-30 Stralingsbron voor optische apparaten, in het bijzonder voor fotolithografische afbeeldingssystemen.

Country Status (5)

Country Link
JP (1) JPS60202936A (fr)
CH (1) CH666776A5 (fr)
DD (1) DD243629A3 (fr)
FR (1) FR2554302A1 (fr)
NL (1) NL8403294A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US9814126B2 (en) 2013-10-17 2017-11-07 Asml Netherlands B.V. Photon source, metrology apparatus, lithographic system and device manufacturing method
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US12014918B2 (en) 2021-05-24 2024-06-18 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8525138B2 (en) 2006-03-31 2013-09-03 Energetiq Technology, Inc. Laser-driven light source
US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
JP6023355B2 (ja) 2013-12-06 2016-11-09 浜松ホトニクス株式会社 発光封体
US9646816B2 (en) 2013-12-06 2017-05-09 Hamamatsu Photonics K.K. Light source device
WO2015086258A1 (fr) * 2013-12-13 2015-06-18 Asml Netherlands B.V. Source de rayonnement, appareil de métrologie, système lithographique et procédé de fabrication de dispositifs
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
EP3143638B1 (fr) * 2014-05-15 2018-11-14 Excelitas Technologies Corp. Lampe monobloc à laser
JP6885636B1 (ja) 2020-03-05 2021-06-16 アールアンドディー−イーサン，リミテッド レーザ励起プラズマ光源およびプラズマ点火方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4348105A (en) * 1981-04-30 1982-09-07 Rca Corporation Radiation shadow projection exposure system

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9814126B2 (en) 2013-10-17 2017-11-07 Asml Netherlands B.V. Photon source, metrology apparatus, lithographic system and device manufacturing method
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10497555B2 (en) 2015-05-14 2019-12-03 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US12014918B2 (en) 2021-05-24 2024-06-18 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition

Also Published As

Publication number Publication date
CH666776A5 (de) 1988-08-15
DD243629A3 (de) 1987-03-11
JPS60202936A (ja) 1985-10-14
FR2554302A1 (fr) 1985-05-03

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