JPS60194067A - 硬質膜の形成方法 - Google Patents
硬質膜の形成方法Info
- Publication number
- JPS60194067A JPS60194067A JP4926884A JP4926884A JPS60194067A JP S60194067 A JPS60194067 A JP S60194067A JP 4926884 A JP4926884 A JP 4926884A JP 4926884 A JP4926884 A JP 4926884A JP S60194067 A JPS60194067 A JP S60194067A
- Authority
- JP
- Japan
- Prior art keywords
- rotating body
- substrate
- forming
- hard film
- hard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title description 3
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 238000000034 method Methods 0.000 claims abstract description 34
- 239000002245 particle Substances 0.000 claims abstract description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 239000000919 ceramic Substances 0.000 claims abstract description 9
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 8
- 239000000956 alloy Substances 0.000 claims abstract description 8
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 8
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 5
- 239000010439 graphite Substances 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 5
- 150000002736 metal compounds Chemical class 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 17
- 230000008021 deposition Effects 0.000 abstract description 10
- 238000001704 evaporation Methods 0.000 abstract description 6
- 238000007740 vapor deposition Methods 0.000 abstract description 6
- 239000000203 mixture Substances 0.000 abstract description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000843 powder Substances 0.000 abstract description 4
- 229910052719 titanium Inorganic materials 0.000 abstract description 4
- 239000010936 titanium Substances 0.000 abstract description 4
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 abstract description 3
- -1 metallic compd. Substances 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 1
- 238000009434 installation Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 239000011812 mixed powder Substances 0.000 description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000008204 material by function Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000004227 thermal cracking Methods 0.000 description 2
- 229910000979 O alloy Inorganic materials 0.000 description 1
- 229910005091 Si3N Inorganic materials 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 210000000936 intestine Anatomy 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 235000012976 tarts Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4926884A JPS60194067A (ja) | 1984-03-16 | 1984-03-16 | 硬質膜の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4926884A JPS60194067A (ja) | 1984-03-16 | 1984-03-16 | 硬質膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60194067A true JPS60194067A (ja) | 1985-10-02 |
| JPS6338428B2 JPS6338428B2 (enrdf_load_stackoverflow) | 1988-07-29 |
Family
ID=12826085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4926884A Granted JPS60194067A (ja) | 1984-03-16 | 1984-03-16 | 硬質膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60194067A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320454A (ja) * | 1986-07-14 | 1988-01-28 | Nippon Kokan Kk <Nkk> | 蒸着装置 |
| WO1996010324A1 (en) * | 1994-09-26 | 1996-04-04 | Fom-Instituut Voor Plasmafysica Rijnhuizen | Laser target for use in an apparatus for generating radiation and atomic particles |
| US5786129A (en) * | 1997-01-13 | 1998-07-28 | Presstek, Inc. | Laser-imageable recording constructions utilizing controlled, self-propagating exothermic chemical reaction mechanisms |
| JP2004238701A (ja) * | 2003-02-07 | 2004-08-26 | Dainippon Printing Co Ltd | イオンプレーティング装置およびこれを用いた成膜方法 |
| JP2008255481A (ja) * | 2007-03-09 | 2008-10-23 | Mitsubishi Materials Corp | 蒸着材 |
| JP2009041219A (ja) * | 2007-08-07 | 2009-02-26 | Toyoda Gosei Co Ltd | 車両用小物入れのロック装置 |
| WO2017025662A1 (en) * | 2015-08-10 | 2017-02-16 | Picodeon Ltd Oy | Method for manufacturing thin films by laser ablation by applying laser pulses with a rotating target |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57158377A (en) * | 1981-03-27 | 1982-09-30 | Ishikawajima Harima Heavy Ind Co Ltd | Plating device for inside surface of pipe utilizing laser beam |
-
1984
- 1984-03-16 JP JP4926884A patent/JPS60194067A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57158377A (en) * | 1981-03-27 | 1982-09-30 | Ishikawajima Harima Heavy Ind Co Ltd | Plating device for inside surface of pipe utilizing laser beam |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320454A (ja) * | 1986-07-14 | 1988-01-28 | Nippon Kokan Kk <Nkk> | 蒸着装置 |
| WO1996010324A1 (en) * | 1994-09-26 | 1996-04-04 | Fom-Instituut Voor Plasmafysica Rijnhuizen | Laser target for use in an apparatus for generating radiation and atomic particles |
| NL9401560A (nl) * | 1994-09-26 | 1996-05-01 | Rijnhuizen Plasmafysica | Werkwijze en inrichting voor het generen van straling en atomaire deeltjes. |
| US5786129A (en) * | 1997-01-13 | 1998-07-28 | Presstek, Inc. | Laser-imageable recording constructions utilizing controlled, self-propagating exothermic chemical reaction mechanisms |
| JP2004238701A (ja) * | 2003-02-07 | 2004-08-26 | Dainippon Printing Co Ltd | イオンプレーティング装置およびこれを用いた成膜方法 |
| JP2008255481A (ja) * | 2007-03-09 | 2008-10-23 | Mitsubishi Materials Corp | 蒸着材 |
| JP2009041219A (ja) * | 2007-08-07 | 2009-02-26 | Toyoda Gosei Co Ltd | 車両用小物入れのロック装置 |
| WO2017025662A1 (en) * | 2015-08-10 | 2017-02-16 | Picodeon Ltd Oy | Method for manufacturing thin films by laser ablation by applying laser pulses with a rotating target |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6338428B2 (enrdf_load_stackoverflow) | 1988-07-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |