JPS62230B2 - - Google Patents
Info
- Publication number
- JPS62230B2 JPS62230B2 JP22558782A JP22558782A JPS62230B2 JP S62230 B2 JPS62230 B2 JP S62230B2 JP 22558782 A JP22558782 A JP 22558782A JP 22558782 A JP22558782 A JP 22558782A JP S62230 B2 JPS62230 B2 JP S62230B2
- Authority
- JP
- Japan
- Prior art keywords
- irradiated
- vacuum chamber
- sample
- laser
- irradiated sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 19
- 238000001704 evaporation Methods 0.000 claims description 11
- 230000008020 evaporation Effects 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000010408 film Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229910052863 mullite Inorganic materials 0.000 description 3
- 238000004227 thermal cracking Methods 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22558782A JPS59116373A (ja) | 1982-12-22 | 1982-12-22 | レ−ザ蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22558782A JPS59116373A (ja) | 1982-12-22 | 1982-12-22 | レ−ザ蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59116373A JPS59116373A (ja) | 1984-07-05 |
| JPS62230B2 true JPS62230B2 (enrdf_load_stackoverflow) | 1987-01-06 |
Family
ID=16831647
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22558782A Granted JPS59116373A (ja) | 1982-12-22 | 1982-12-22 | レ−ザ蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59116373A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02146496A (ja) * | 1988-11-29 | 1990-06-05 | Toshiba Corp | 金属溶融用るつぼ |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62170474A (ja) * | 1986-01-23 | 1987-07-27 | Agency Of Ind Science & Technol | レ−ザ蒸着装置 |
| US4816293A (en) * | 1986-03-27 | 1989-03-28 | Mitsubishi Denki Kabushiki Kaisha | Process for coating a workpiece with a ceramic material |
| JPS63137162A (ja) * | 1986-11-28 | 1988-06-09 | Mitsubishi Electric Corp | レ−ザ蒸着式多層膜形成装置 |
| JP2650910B2 (ja) * | 1987-04-22 | 1997-09-10 | 株式会社日立製作所 | 酸化物超伝導体薄膜の形成方法 |
| JPH01172216A (ja) * | 1987-12-26 | 1989-07-07 | Tokai Univ | 超電導材の製造方法 |
| DE69032824T2 (de) * | 1989-07-06 | 1999-06-10 | Toyota Jidosha K.K., Toyota, Aichi | Verfahren zum Laseraufdampfen |
| JPH06192821A (ja) * | 1991-03-26 | 1994-07-12 | Toyo Eng Corp | レーザｐｖｄ装置 |
| FR2689315A1 (fr) * | 1992-03-27 | 1993-10-01 | Alsthom Cge Alcatel | Procédé de fabrication d'un substrat pour l'électronique de puissance et substrat obtenu par ce procédé. |
| FI126769B (en) | 2014-12-23 | 2017-05-15 | Picodeon Ltd Oy | Lighthouse type scanner with rotating mirror and annular focus |
-
1982
- 1982-12-22 JP JP22558782A patent/JPS59116373A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02146496A (ja) * | 1988-11-29 | 1990-06-05 | Toshiba Corp | 金属溶融用るつぼ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59116373A (ja) | 1984-07-05 |
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