JPS60189238A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS60189238A JPS60189238A JP59044100A JP4410084A JPS60189238A JP S60189238 A JPS60189238 A JP S60189238A JP 59044100 A JP59044100 A JP 59044100A JP 4410084 A JP4410084 A JP 4410084A JP S60189238 A JPS60189238 A JP S60189238A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- porous silicon
- pressure
- oxide film
- silicon oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
Landscapes
- Element Separation (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59044100A JPS60189238A (ja) | 1984-03-09 | 1984-03-09 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59044100A JPS60189238A (ja) | 1984-03-09 | 1984-03-09 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60189238A true JPS60189238A (ja) | 1985-09-26 |
| JPH0312773B2 JPH0312773B2 (https=) | 1991-02-21 |
Family
ID=12682193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59044100A Granted JPS60189238A (ja) | 1984-03-09 | 1984-03-09 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60189238A (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02189920A (ja) * | 1989-01-18 | 1990-07-25 | Nec Corp | 酸化膜の形成方法及び酸化装置 |
| JPH0438985U (https=) * | 1990-07-31 | 1992-04-02 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59144149A (ja) * | 1983-02-08 | 1984-08-18 | Toko Inc | 誘電体分離基板の製造方法 |
-
1984
- 1984-03-09 JP JP59044100A patent/JPS60189238A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59144149A (ja) * | 1983-02-08 | 1984-08-18 | Toko Inc | 誘電体分離基板の製造方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02189920A (ja) * | 1989-01-18 | 1990-07-25 | Nec Corp | 酸化膜の形成方法及び酸化装置 |
| JPH0438985U (https=) * | 1990-07-31 | 1992-04-02 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0312773B2 (https=) | 1991-02-21 |
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