JPS60186804A - 光記録媒体 - Google Patents
光記録媒体Info
- Publication number
- JPS60186804A JPS60186804A JP59042323A JP4232384A JPS60186804A JP S60186804 A JPS60186804 A JP S60186804A JP 59042323 A JP59042323 A JP 59042323A JP 4232384 A JP4232384 A JP 4232384A JP S60186804 A JPS60186804 A JP S60186804A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- films
- thickness
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000000737 periodic effect Effects 0.000 title claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 abstract description 13
- 239000000758 substrate Substances 0.000 abstract description 10
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract description 4
- 229910017052 cobalt Inorganic materials 0.000 abstract description 3
- 239000010941 cobalt Substances 0.000 abstract description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 3
- 238000001816 cooling Methods 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 238000010030 laminating Methods 0.000 abstract 1
- 230000010355 oscillation Effects 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 80
- 125000006850 spacer group Chemical group 0.000 description 11
- 239000010410 layer Substances 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 4
- 239000002356 single layer Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- -1 and PT Inorganic materials 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Non-Insulated Conductors (AREA)
- Optics & Photonics (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- General Physics & Mathematics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Filters (AREA)
- Laminated Bodies (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59042323A JPS60186804A (ja) | 1984-03-06 | 1984-03-06 | 光記録媒体 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59042323A JPS60186804A (ja) | 1984-03-06 | 1984-03-06 | 光記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60186804A true JPS60186804A (ja) | 1985-09-24 |
JPH0441670B2 JPH0441670B2 (enrdf_load_stackoverflow) | 1992-07-09 |
Family
ID=12632797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59042323A Granted JPS60186804A (ja) | 1984-03-06 | 1984-03-06 | 光記録媒体 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60186804A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5051288A (en) * | 1989-03-16 | 1991-09-24 | International Business Machines Corporation | Thin film magnetic recording disk comprising alternating layers of a CoNi or CoPt alloy and a non-magnetic spacer layer |
KR100581852B1 (ko) * | 2002-06-12 | 2006-05-22 | 삼성에스디아이 주식회사 | 박막 증착장치 및 이를 이용한 박막 증착방법 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50151151A (enrdf_load_stackoverflow) * | 1974-05-25 | 1975-12-04 | ||
JPS5655910A (en) * | 1979-10-13 | 1981-05-16 | Fujitsu Ltd | Production of optical multilayer film |
JPS5727788A (en) * | 1980-07-25 | 1982-02-15 | Asahi Chem Ind Co Ltd | Information recording member |
JPS5741997A (en) * | 1980-08-27 | 1982-03-09 | Asahi Chem Ind Co Ltd | Information recording member |
JPS57135197A (en) * | 1981-02-16 | 1982-08-20 | Asahi Chem Ind Co Ltd | Information recording medium |
JPS57141034A (en) * | 1981-02-23 | 1982-09-01 | Asahi Chem Ind Co Ltd | Member for information recording |
JPS5885945A (ja) * | 1981-11-17 | 1983-05-23 | Asahi Chem Ind Co Ltd | 情報記録用部材 |
JPS58111141A (ja) * | 1981-12-23 | 1983-07-02 | Fujitsu Ltd | 情報記録媒体 |
JPS58144804A (ja) * | 1981-12-04 | 1983-08-29 | ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング | 多色の微細構造を有する、特に微細地図の形式の記録支持体とその製法 |
JPS599094A (ja) * | 1982-07-09 | 1984-01-18 | Asahi Chem Ind Co Ltd | 情報記録用部材 |
-
1984
- 1984-03-06 JP JP59042323A patent/JPS60186804A/ja active Granted
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50151151A (enrdf_load_stackoverflow) * | 1974-05-25 | 1975-12-04 | ||
JPS5655910A (en) * | 1979-10-13 | 1981-05-16 | Fujitsu Ltd | Production of optical multilayer film |
JPS5727788A (en) * | 1980-07-25 | 1982-02-15 | Asahi Chem Ind Co Ltd | Information recording member |
JPS5741997A (en) * | 1980-08-27 | 1982-03-09 | Asahi Chem Ind Co Ltd | Information recording member |
JPS57135197A (en) * | 1981-02-16 | 1982-08-20 | Asahi Chem Ind Co Ltd | Information recording medium |
JPS57141034A (en) * | 1981-02-23 | 1982-09-01 | Asahi Chem Ind Co Ltd | Member for information recording |
JPS5885945A (ja) * | 1981-11-17 | 1983-05-23 | Asahi Chem Ind Co Ltd | 情報記録用部材 |
JPS58144804A (ja) * | 1981-12-04 | 1983-08-29 | ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング | 多色の微細構造を有する、特に微細地図の形式の記録支持体とその製法 |
JPS58111141A (ja) * | 1981-12-23 | 1983-07-02 | Fujitsu Ltd | 情報記録媒体 |
JPS599094A (ja) * | 1982-07-09 | 1984-01-18 | Asahi Chem Ind Co Ltd | 情報記録用部材 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5051288A (en) * | 1989-03-16 | 1991-09-24 | International Business Machines Corporation | Thin film magnetic recording disk comprising alternating layers of a CoNi or CoPt alloy and a non-magnetic spacer layer |
KR100581852B1 (ko) * | 2002-06-12 | 2006-05-22 | 삼성에스디아이 주식회사 | 박막 증착장치 및 이를 이용한 박막 증착방법 |
Also Published As
Publication number | Publication date |
---|---|
JPH0441670B2 (enrdf_load_stackoverflow) | 1992-07-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |