JPS60184672A - クロム化合物層の製造方法 - Google Patents
クロム化合物層の製造方法Info
- Publication number
- JPS60184672A JPS60184672A JP59038282A JP3828284A JPS60184672A JP S60184672 A JPS60184672 A JP S60184672A JP 59038282 A JP59038282 A JP 59038282A JP 3828284 A JP3828284 A JP 3828284A JP S60184672 A JPS60184672 A JP S60184672A
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- etching
- layer
- power
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 150000001845 chromium compounds Chemical class 0.000 title claims abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 13
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910000423 chromium oxide Inorganic materials 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 238000005546 reactive sputtering Methods 0.000 claims abstract description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims abstract description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 5
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 29
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 abstract description 26
- 238000000034 method Methods 0.000 abstract description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 12
- 239000007921 spray Substances 0.000 abstract description 12
- 239000011651 chromium Substances 0.000 abstract description 10
- 229910052804 chromium Inorganic materials 0.000 abstract description 9
- 239000001301 oxygen Substances 0.000 abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 abstract description 4
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910001902 chlorine oxide Inorganic materials 0.000 description 1
- MAYPHUUCLRDEAZ-UHFFFAOYSA-N chlorine peroxide Chemical compound ClOOCl MAYPHUUCLRDEAZ-UHFFFAOYSA-N 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 210000000936 intestine Anatomy 0.000 description 1
- 239000010812 mixed waste Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59038282A JPS60184672A (ja) | 1984-02-29 | 1984-02-29 | クロム化合物層の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59038282A JPS60184672A (ja) | 1984-02-29 | 1984-02-29 | クロム化合物層の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60184672A true JPS60184672A (ja) | 1985-09-20 |
| JPH0373628B2 JPH0373628B2 (enrdf_load_stackoverflow) | 1991-11-22 |
Family
ID=12520953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59038282A Granted JPS60184672A (ja) | 1984-02-29 | 1984-02-29 | クロム化合物層の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60184672A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6283461A (ja) * | 1985-10-09 | 1987-04-16 | Seiko Epson Corp | 時計用外装部品の製造方法 |
| JPS6296666A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| JPS6296665A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| JPS63262454A (ja) * | 1987-03-26 | 1988-10-28 | ピーピージー インダストリーズ，インコーポレーテツド | オキシ窒化チタン被覆物品及びその製造方法 |
| GB2276176A (en) * | 1993-03-15 | 1994-09-21 | Teikoku Piston Ring Co Ltd | Hard coating material based on chromium nitride and sliding member coated therewith |
| CN109338137A (zh) * | 2013-01-24 | 2019-02-15 | 世特科表面技术及陶瓷粉末股份有限公司 | 制备含氮化铬的喷涂粉末的方法 |
| CN116288143A (zh) * | 2023-03-17 | 2023-06-23 | 深圳奥卓真空设备技术有限公司 | 一种光学双稳态镀膜工艺 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07305163A (ja) * | 1994-05-10 | 1995-11-21 | Itochu Fine Chem Kk | 低反射クロム系膜 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
-
1984
- 1984-02-29 JP JP59038282A patent/JPS60184672A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6283461A (ja) * | 1985-10-09 | 1987-04-16 | Seiko Epson Corp | 時計用外装部品の製造方法 |
| JPS6296666A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| JPS6296665A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| JPS63262454A (ja) * | 1987-03-26 | 1988-10-28 | ピーピージー インダストリーズ，インコーポレーテツド | オキシ窒化チタン被覆物品及びその製造方法 |
| GB2276176A (en) * | 1993-03-15 | 1994-09-21 | Teikoku Piston Ring Co Ltd | Hard coating material based on chromium nitride and sliding member coated therewith |
| US5449547A (en) * | 1993-03-15 | 1995-09-12 | Teikoku Piston Ring Co., Ltd. | Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member |
| GB2276176B (en) * | 1993-03-15 | 1996-12-04 | Teikoku Piston Ring Co Ltd | Hard coating material,sliding member coated with hard coating material and method for manufacturing sliding member |
| CN109338137A (zh) * | 2013-01-24 | 2019-02-15 | 世特科表面技术及陶瓷粉末股份有限公司 | 制备含氮化铬的喷涂粉末的方法 |
| CN109338137B (zh) * | 2013-01-24 | 2021-02-02 | 世特科表面技术及陶瓷粉末股份有限公司 | 制备含氮化铬的喷涂粉末的方法 |
| CN116288143A (zh) * | 2023-03-17 | 2023-06-23 | 深圳奥卓真空设备技术有限公司 | 一种光学双稳态镀膜工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0373628B2 (enrdf_load_stackoverflow) | 1991-11-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |