JPH0373628B2 - - Google Patents

Info

Publication number
JPH0373628B2
JPH0373628B2 JP59038282A JP3828284A JPH0373628B2 JP H0373628 B2 JPH0373628 B2 JP H0373628B2 JP 59038282 A JP59038282 A JP 59038282A JP 3828284 A JP3828284 A JP 3828284A JP H0373628 B2 JPH0373628 B2 JP H0373628B2
Authority
JP
Japan
Prior art keywords
gas
etching
chromium
flow rate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59038282A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60184672A (ja
Inventor
Takayuki Kato
Takashi Hatano
Mayumi Okasato
Mariko Iwashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP59038282A priority Critical patent/JPS60184672A/ja
Publication of JPS60184672A publication Critical patent/JPS60184672A/ja
Publication of JPH0373628B2 publication Critical patent/JPH0373628B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP59038282A 1984-02-29 1984-02-29 クロム化合物層の製造方法 Granted JPS60184672A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59038282A JPS60184672A (ja) 1984-02-29 1984-02-29 クロム化合物層の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59038282A JPS60184672A (ja) 1984-02-29 1984-02-29 クロム化合物層の製造方法

Publications (2)

Publication Number Publication Date
JPS60184672A JPS60184672A (ja) 1985-09-20
JPH0373628B2 true JPH0373628B2 (enrdf_load_stackoverflow) 1991-11-22

Family

ID=12520953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59038282A Granted JPS60184672A (ja) 1984-02-29 1984-02-29 クロム化合物層の製造方法

Country Status (1)

Country Link
JP (1) JPS60184672A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07305163A (ja) * 1994-05-10 1995-11-21 Itochu Fine Chem Kk 低反射クロム系膜

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0765156B2 (ja) * 1985-10-09 1995-07-12 セイコーエプソン株式会社 時計用外装部品の製造方法
JP2524103B2 (ja) * 1985-10-22 1996-08-14 セイコーエプソン株式会社 時計用外装部品
JPH0742568B2 (ja) * 1985-10-22 1995-05-10 セイコーエプソン株式会社 時計用外装部品
CA1333270C (en) * 1987-03-26 1994-11-29 Ppg Industries Ohio, Inc. Sputtered titanium oxynitride films
US5449547A (en) * 1993-03-15 1995-09-12 Teikoku Piston Ring Co., Ltd. Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member
DE102013201104A1 (de) * 2013-01-24 2014-07-24 H.C. Starck Gmbh Verfahren zur Herstellung von Chromnitrid-haltigen Spritzpulvern
CN116288143A (zh) * 2023-03-17 2023-06-23 深圳奥卓真空设备技术有限公司 一种光学双稳态镀膜工艺

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07305163A (ja) * 1994-05-10 1995-11-21 Itochu Fine Chem Kk 低反射クロム系膜

Also Published As

Publication number Publication date
JPS60184672A (ja) 1985-09-20

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term