JPS60174864A - 薄膜形成用アルミニウム基材の表面処理方法 - Google Patents

薄膜形成用アルミニウム基材の表面処理方法

Info

Publication number
JPS60174864A
JPS60174864A JP2784084A JP2784084A JPS60174864A JP S60174864 A JPS60174864 A JP S60174864A JP 2784084 A JP2784084 A JP 2784084A JP 2784084 A JP2784084 A JP 2784084A JP S60174864 A JPS60174864 A JP S60174864A
Authority
JP
Japan
Prior art keywords
base material
oxide film
thin film
aluminum base
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2784084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0461069B2 (enrdf_load_stackoverflow
Inventor
Kenji Tsukamoto
塚本 建次
Yutaka Kato
豊 加藤
Eizo Isoyama
礒山 永三
Shigemi Tanimoto
谷本 繁美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2784084A priority Critical patent/JPS60174864A/ja
Publication of JPS60174864A publication Critical patent/JPS60174864A/ja
Publication of JPH0461069B2 publication Critical patent/JPH0461069B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10Oxidising
    • C23C8/12Oxidising using elemental oxygen or ozone

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP2784084A 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法 Granted JPS60174864A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2784084A JPS60174864A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2784084A JPS60174864A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Publications (2)

Publication Number Publication Date
JPS60174864A true JPS60174864A (ja) 1985-09-09
JPH0461069B2 JPH0461069B2 (enrdf_load_stackoverflow) 1992-09-29

Family

ID=12232115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2784084A Granted JPS60174864A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Country Status (1)

Country Link
JP (1) JPS60174864A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134660A (ja) * 1986-11-25 1988-06-07 Mitsubishi Metal Corp 表面被覆炭窒化チタン基サーメット製切削工具の製造法
JPS6479755A (en) * 1987-09-21 1989-03-24 Furukawa Aluminium Drum of photosensitive body for laser beam printer and manufacture of same
JPH01131571A (ja) * 1987-11-17 1989-05-24 Mita Ind Co Ltd 感光体用基板の製造法
JPH01131572A (ja) * 1987-11-17 1989-05-24 Mita Ind Co Ltd 感光体用基板の製造法
US5409531A (en) * 1992-07-01 1995-04-25 Hitachi Powdered Metals Co., Ltd. Releasing agent for die casting

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146142A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Electrophotographic sensitive film
JPS57147644A (en) * 1981-03-10 1982-09-11 Ricoh Co Ltd Photoreceptor for electrophotography
JPS5811944A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5814841A (ja) * 1981-07-20 1983-01-27 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5815239A (ja) * 1981-07-21 1983-01-28 Ricoh Co Ltd 半導体素子
JPS5860747A (ja) * 1981-10-07 1983-04-11 Oki Electric Ind Co Ltd 電子写真感光体
JPS58159842A (ja) * 1982-03-17 1983-09-22 Ricoh Co Ltd 感光体の製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146142A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Electrophotographic sensitive film
JPS57147644A (en) * 1981-03-10 1982-09-11 Ricoh Co Ltd Photoreceptor for electrophotography
JPS5811944A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5814841A (ja) * 1981-07-20 1983-01-27 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5815239A (ja) * 1981-07-21 1983-01-28 Ricoh Co Ltd 半導体素子
JPS5860747A (ja) * 1981-10-07 1983-04-11 Oki Electric Ind Co Ltd 電子写真感光体
JPS58159842A (ja) * 1982-03-17 1983-09-22 Ricoh Co Ltd 感光体の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134660A (ja) * 1986-11-25 1988-06-07 Mitsubishi Metal Corp 表面被覆炭窒化チタン基サーメット製切削工具の製造法
JPS6479755A (en) * 1987-09-21 1989-03-24 Furukawa Aluminium Drum of photosensitive body for laser beam printer and manufacture of same
JPH01131571A (ja) * 1987-11-17 1989-05-24 Mita Ind Co Ltd 感光体用基板の製造法
JPH01131572A (ja) * 1987-11-17 1989-05-24 Mita Ind Co Ltd 感光体用基板の製造法
US5409531A (en) * 1992-07-01 1995-04-25 Hitachi Powdered Metals Co., Ltd. Releasing agent for die casting

Also Published As

Publication number Publication date
JPH0461069B2 (enrdf_load_stackoverflow) 1992-09-29

Similar Documents

Publication Publication Date Title
US5811195A (en) Corrosion-resistant aluminum article for semiconductor processing equipment
JPS61110781A (ja) ソリツドステーツ半導体デイバイスの製作におけるアルミニウムの腐食抑制法及び該デイバイスの製造法
JPS60174864A (ja) 薄膜形成用アルミニウム基材の表面処理方法
EP0146115B1 (en) Process for producing aluminum material for use in vacuum
JPH0461068B2 (enrdf_load_stackoverflow)
JPH04183846A (ja) 高純度ガス用ステンレス鋼材及びその製造方法
JPH0461070B2 (enrdf_load_stackoverflow)
KR100749145B1 (ko) 보호막 부착 실리콘 보트 및 그 제조방법, 그를 이용하여열처리된 실리콘 웨이퍼
JPH07201673A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JPS6140747B2 (enrdf_load_stackoverflow)
JPH11283924A (ja) 半導体ウエハ製造方法
JPS6140748B2 (enrdf_load_stackoverflow)
JP3262696B2 (ja) ガラス状カーボン被膜を有するシリカガラス部材
JP2005191352A (ja) 多層反射膜付き基板の再生方法、多層反射膜付き基板の製造方法及び反射型マスクブランクスの製造方法
JPS59162200A (ja) シリコン基板表面の清浄化法
JPH0471880B2 (enrdf_load_stackoverflow)
JPH06136495A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JP3029953B2 (ja) 半導体ウェーハの熱処理装置
JPH0320469B2 (enrdf_load_stackoverflow)
JPS6323098A (ja) 高純度ガス充填用ボンベ
JPH10194876A (ja) 半導体用治具の製造方法
JPH0328515B2 (enrdf_load_stackoverflow)
JPH02129364A (ja) 真空蒸着用銅基材の製造方法
JPH04259221A (ja) 半導体ウェーハ用洗浄液
JP3531576B2 (ja) 二酸化珪素被膜の形成方法