JPH0461069B2 - - Google Patents

Info

Publication number
JPH0461069B2
JPH0461069B2 JP59027840A JP2784084A JPH0461069B2 JP H0461069 B2 JPH0461069 B2 JP H0461069B2 JP 59027840 A JP59027840 A JP 59027840A JP 2784084 A JP2784084 A JP 2784084A JP H0461069 B2 JPH0461069 B2 JP H0461069B2
Authority
JP
Japan
Prior art keywords
base material
oxide film
aluminum base
film
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59027840A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60174864A (ja
Inventor
Kenji Tsukamoto
Yutaka Kato
Eizo Isoyama
Shigemi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2784084A priority Critical patent/JPS60174864A/ja
Publication of JPS60174864A publication Critical patent/JPS60174864A/ja
Publication of JPH0461069B2 publication Critical patent/JPH0461069B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • C23C8/12—Oxidising using elemental oxygen or ozone

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Formation Of Insulating Films (AREA)
JP2784084A 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法 Granted JPS60174864A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2784084A JPS60174864A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2784084A JPS60174864A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Publications (2)

Publication Number Publication Date
JPS60174864A JPS60174864A (ja) 1985-09-09
JPH0461069B2 true JPH0461069B2 (enrdf_load_stackoverflow) 1992-09-29

Family

ID=12232115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2784084A Granted JPS60174864A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Country Status (1)

Country Link
JP (1) JPS60174864A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798994B2 (ja) * 1986-11-25 1995-10-25 三菱マテリアル株式会社 表面被覆炭窒化チタン基サーメット製切削工具の製造法
JPS6479755A (en) * 1987-09-21 1989-03-24 Furukawa Aluminium Drum of photosensitive body for laser beam printer and manufacture of same
JP2513738B2 (ja) * 1987-11-17 1996-07-03 三田工業株式会社 感光体用基板の製造法
JP2513737B2 (ja) * 1987-11-17 1996-07-03 三田工業株式会社 感光体用基板の製造法
US5409531A (en) * 1992-07-01 1995-04-25 Hitachi Powdered Metals Co., Ltd. Releasing agent for die casting

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146142A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Electrophotographic sensitive film
JPS57147644A (en) * 1981-03-10 1982-09-11 Ricoh Co Ltd Photoreceptor for electrophotography
JPS5811944A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5814841A (ja) * 1981-07-20 1983-01-27 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5815239A (ja) * 1981-07-21 1983-01-28 Ricoh Co Ltd 半導体素子
JPS5860747A (ja) * 1981-10-07 1983-04-11 Oki Electric Ind Co Ltd 電子写真感光体
JPS58159842A (ja) * 1982-03-17 1983-09-22 Ricoh Co Ltd 感光体の製造方法

Also Published As

Publication number Publication date
JPS60174864A (ja) 1985-09-09

Similar Documents

Publication Publication Date Title
US6565984B1 (en) Clean aluminum alloy for semiconductor processing equipment
JP2009101357A (ja) 光触媒体の製造装置
JPH0461069B2 (enrdf_load_stackoverflow)
US4904515A (en) Heat-treatment member for semiconductor elements
JP2009249254A (ja) タンタル酸リチウム結晶の製造方法及びタンタル酸リチウム結晶
JPH0461068B2 (enrdf_load_stackoverflow)
EP0146115B1 (en) Process for producing aluminum material for use in vacuum
JPH0461070B2 (enrdf_load_stackoverflow)
KR100749145B1 (ko) 보호막 부착 실리콘 보트 및 그 제조방법, 그를 이용하여열처리된 실리콘 웨이퍼
JP3852632B2 (ja) 電解コンデンサ用アルミニウム箔の製造方法
JP4315406B2 (ja) Ｍｇ蒸発材料の加工方法
JPH07201673A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JPS6140748B2 (enrdf_load_stackoverflow)
JPS6140747B2 (enrdf_load_stackoverflow)
JPH11283924A (ja) 半導体ウエハ製造方法
JPH0456309A (ja) 電解コンデンサ用エッチング箔の製造方法
JPH06136495A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JP3337506B2 (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JPH0328515B2 (enrdf_load_stackoverflow)
JPH08335576A (ja) シリコン酸化膜の形成方法
JP4308556B2 (ja) 電解コンデンサ電極用アルミニウム材および電解コンデンサ電極材の製造方法並びに電解コンデンサ
JPH10194876A (ja) 半導体用治具の製造方法
JPH04311550A (ja) 電解コンデンサ電極用アルミニウム箔の製造方法
JPS6323098A (ja) 高純度ガス充填用ボンベ
JP3531576B2 (ja) 二酸化珪素被膜の形成方法