JPS6016802A - 半導体用原料ガスの純化剤およびその使用方法 - Google Patents

半導体用原料ガスの純化剤およびその使用方法

Info

Publication number
JPS6016802A
JPS6016802A JP58120646A JP12064683A JPS6016802A JP S6016802 A JPS6016802 A JP S6016802A JP 58120646 A JP58120646 A JP 58120646A JP 12064683 A JP12064683 A JP 12064683A JP S6016802 A JPS6016802 A JP S6016802A
Authority
JP
Japan
Prior art keywords
carrier
gas
raw material
semiconductor
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58120646A
Other languages
English (en)
Japanese (ja)
Other versions
JPH054321B2 (enExample
Inventor
Atsushi Yusa
遊佐　厚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Sanso Co Ltd
Olympus Corp
Original Assignee
Daido Sanso Co Ltd
Olympus Corp
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Sanso Co Ltd, Olympus Corp, Olympus Optical Co Ltd filed Critical Daido Sanso Co Ltd
Priority to JP58120646A priority Critical patent/JPS6016802A/ja
Priority to US06/622,757 priority patent/US4565677A/en
Publication of JPS6016802A publication Critical patent/JPS6016802A/ja
Publication of JPH054321B2 publication Critical patent/JPH054321B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/06—Hydrogen phosphides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/046—Purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/34—Purification; Stabilisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Silicon Compounds (AREA)
JP58120646A 1983-07-01 1983-07-01 半導体用原料ガスの純化剤およびその使用方法 Granted JPS6016802A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58120646A JPS6016802A (ja) 1983-07-01 1983-07-01 半導体用原料ガスの純化剤およびその使用方法
US06/622,757 US4565677A (en) 1983-07-01 1984-06-20 Method for purifying raw material gas for use in semiconductor manufacturing and purifier for use in said method and method of manufacturing said purifier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58120646A JPS6016802A (ja) 1983-07-01 1983-07-01 半導体用原料ガスの純化剤およびその使用方法

Publications (2)

Publication Number Publication Date
JPS6016802A true JPS6016802A (ja) 1985-01-28
JPH054321B2 JPH054321B2 (enExample) 1993-01-19

Family

ID=14791371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58120646A Granted JPS6016802A (ja) 1983-07-01 1983-07-01 半導体用原料ガスの純化剤およびその使用方法

Country Status (2)

Country Link
US (1) US4565677A (enExample)
JP (1) JPS6016802A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60209249A (ja) * 1984-04-02 1985-10-21 Olympus Optical Co Ltd 工業用原料ガスの純化剤，その製造方法およびその使用方法
JPS63169719A (ja) * 1987-01-08 1988-07-13 Mitsubishi Electric Corp 化学反応装置
JPH04128673U (ja) * 1990-06-18 1992-11-24 株式会社ホンゴウリミテド 箸ジヨイナー及び箸置き

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4659552A (en) * 1986-07-21 1987-04-21 Hercules Incorporated Scavengers for the removal of impurities from arsine and phosphine
US4696953A (en) * 1986-07-21 1987-09-29 Hercules Incorporated Scavengers for the removal of impurities from arsine and phosphine
US4716181A (en) * 1986-07-21 1987-12-29 Hercules Incorporated Scavengers for the removal of impurities from arsine and phosphine
US4761395A (en) * 1987-03-24 1988-08-02 Advanced Technology Materials, Inc. Process and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
US4976933A (en) * 1987-07-13 1990-12-11 Ethyl Corporation Hydrogen stream purification
DE3805282A1 (de) * 1988-02-19 1989-08-31 Wacker Chemitronic Verfahren zur entfernung von n-dotierenden verunreinigungen aus bei der gasphasenabscheidung von silicium anfallenden fluessigen oder gasfoermigen stoffen
KR960010082B1 (ko) * 1988-09-26 1996-07-25 니혼 파이오닉스 가부시끼가이샤 기체성 수소화물의 정제방법
JP2732262B2 (ja) * 1988-09-26 1998-03-25 日本パイオニクス株式会社 アルシンの精製方法
IT1246358B (it) * 1990-07-12 1994-11-17 Getters Spa Processo per eliminare impurita' da un gas idruro
EP0611140B1 (en) * 1993-02-11 2000-06-28 The BOC Group plc Gas stream purification method
WO2000023174A1 (en) * 1998-10-22 2000-04-27 Matheson Tri Gas, Inc. Scavenger for reducing impurities in a gas and methods and apparatuses for making and using same
US7250072B2 (en) * 2003-11-19 2007-07-31 Air Products And Chemicals, Inc. Removal of sulfur-containing impurities from volatile metal hydrides
US7087102B2 (en) * 2004-02-26 2006-08-08 Air Products And Chemicals, Inc. Process for purification of germane

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688380A (en) * 1979-12-21 1981-07-17 Canon Inc Amorphous hydrogenated silicon photoconductive layer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1681702A (en) * 1925-11-12 1928-08-21 Karl Muller Method for purifying gases
US2547874A (en) * 1948-05-24 1951-04-03 Ernest D Klema Hydrogen purification method
US2826480A (en) * 1953-02-12 1958-03-11 British Oxygen Co Ltd Removal of oxygen or hydrogen from gases
US4353788A (en) * 1980-08-26 1982-10-12 The United States Of America As Represented By The United States Department Of Energy RF Sputtering for preparing substantially pure amorphous silicon monohydride

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688380A (en) * 1979-12-21 1981-07-17 Canon Inc Amorphous hydrogenated silicon photoconductive layer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60209249A (ja) * 1984-04-02 1985-10-21 Olympus Optical Co Ltd 工業用原料ガスの純化剤，その製造方法およびその使用方法
JPS63169719A (ja) * 1987-01-08 1988-07-13 Mitsubishi Electric Corp 化学反応装置
JPH04128673U (ja) * 1990-06-18 1992-11-24 株式会社ホンゴウリミテド 箸ジヨイナー及び箸置き

Also Published As

Publication number Publication date
US4565677A (en) 1986-01-21
JPH054321B2 (enExample) 1993-01-19

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