JPS60151147U - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS60151147U JPS60151147U JP3887284U JP3887284U JPS60151147U JP S60151147 U JPS60151147 U JP S60151147U JP 3887284 U JP3887284 U JP 3887284U JP 3887284 U JP3887284 U JP 3887284U JP S60151147 U JPS60151147 U JP S60151147U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- silicon nitride
- semiconductor device
- plasma silicon
- nitride film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3887284U JPS60151147U (ja) | 1984-03-16 | 1984-03-16 | 半導体装置 |
| CA000470776A CA1218470A (en) | 1983-12-24 | 1984-12-21 | Semiconductor device with polycrystalline silicon active region and ic including semiconductor device |
| DE8484116301T DE3485817T2 (de) | 1983-12-24 | 1984-12-24 | Verfahren zur herstellung einer halbleiteranordnung mit einer aktiven zone aus polykristallinem silicium. |
| EP84116301A EP0152624B1 (en) | 1983-12-24 | 1984-12-24 | Method of manufacturing a semiconductor device having a polycristalline silicon-active region. |
| US07/703,057 US5162892A (en) | 1983-12-24 | 1991-05-17 | Semiconductor device with polycrystalline silicon active region and hydrogenated passivation layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3887284U JPS60151147U (ja) | 1984-03-16 | 1984-03-16 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60151147U true JPS60151147U (ja) | 1985-10-07 |
| JPH0341479Y2 JPH0341479Y2 (cg-RX-API-DMAC7.html) | 1991-08-30 |
Family
ID=30546281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3887284U Granted JPS60151147U (ja) | 1983-12-24 | 1984-03-16 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60151147U (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016131261A (ja) * | 2011-05-13 | 2016-07-21 | 株式会社半導体エネルギー研究所 | 半導体装置 |
-
1984
- 1984-03-16 JP JP3887284U patent/JPS60151147U/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016131261A (ja) * | 2011-05-13 | 2016-07-21 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0341479Y2 (cg-RX-API-DMAC7.html) | 1991-08-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| MY130168A (en) | Semiconductor device and manufacturing method thereof | |
| JPS60151147U (ja) | 半導体装置 | |
| JPH02114670A (ja) | 電界効果トランジスタ | |
| JPS60942U (ja) | 半導体装置 | |
| JPH02118954U (cg-RX-API-DMAC7.html) | ||
| JPS62274662A (ja) | Mis型半導体装置 | |
| JPS6018558U (ja) | 薄膜トランジスタ素子 | |
| JPS62196358U (cg-RX-API-DMAC7.html) | ||
| JPH03120054U (cg-RX-API-DMAC7.html) | ||
| JPH0342124U (cg-RX-API-DMAC7.html) | ||
| JPS62186445U (cg-RX-API-DMAC7.html) | ||
| JPS6142863U (ja) | Mos半導体装置 | |
| JPS6099553U (ja) | 半導体装置 | |
| JPS62204354U (cg-RX-API-DMAC7.html) | ||
| JPH0383939U (cg-RX-API-DMAC7.html) | ||
| JPS60116255U (ja) | 半導体装置 | |
| JPS6142860U (ja) | 相補型mos半導体装置 | |
| JPS60166158U (ja) | メモリーセル | |
| JPS5926265U (ja) | 半導体装置 | |
| JPS6266666A (ja) | マクテイブマトリツクス基板 | |
| JPH01165660U (cg-RX-API-DMAC7.html) | ||
| JPS6221558U (cg-RX-API-DMAC7.html) | ||
| JPH0385659U (cg-RX-API-DMAC7.html) | ||
| JPS63167754U (cg-RX-API-DMAC7.html) | ||
| JPS58180646U (ja) | 電界効果トランジスタ |