JPS60144937A - アライメントマ−クの検出装置 - Google Patents

アライメントマ−クの検出装置

Info

Publication number
JPS60144937A
JPS60144937A JP59000488A JP48884A JPS60144937A JP S60144937 A JPS60144937 A JP S60144937A JP 59000488 A JP59000488 A JP 59000488A JP 48884 A JP48884 A JP 48884A JP S60144937 A JPS60144937 A JP S60144937A
Authority
JP
Japan
Prior art keywords
alignment mark
wafer
marks
output
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59000488A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0550128B2 (enrdf_load_stackoverflow
Inventor
Keiichiro Sakado
坂戸　啓一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP59000488A priority Critical patent/JPS60144937A/ja
Publication of JPS60144937A publication Critical patent/JPS60144937A/ja
Publication of JPH0550128B2 publication Critical patent/JPH0550128B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59000488A 1984-01-05 1984-01-05 アライメントマ−クの検出装置 Granted JPS60144937A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59000488A JPS60144937A (ja) 1984-01-05 1984-01-05 アライメントマ−クの検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59000488A JPS60144937A (ja) 1984-01-05 1984-01-05 アライメントマ−クの検出装置

Publications (2)

Publication Number Publication Date
JPS60144937A true JPS60144937A (ja) 1985-07-31
JPH0550128B2 JPH0550128B2 (enrdf_load_stackoverflow) 1993-07-28

Family

ID=11475149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59000488A Granted JPS60144937A (ja) 1984-01-05 1984-01-05 アライメントマ−クの検出装置

Country Status (1)

Country Link
JP (1) JPS60144937A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62155532A (ja) * 1985-12-27 1987-07-10 Nec Corp 半導体ウエ−ハの位置合せマ−クの形成方法
JPH0430414A (ja) * 1990-05-25 1992-02-03 Matsushita Electric Ind Co Ltd 位置決め装置
JP2009533702A (ja) * 2006-04-11 2009-09-17 マイクロニック レーザー システムズ アクチボラゲット 位置合わせ方法及びそのための装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62155532A (ja) * 1985-12-27 1987-07-10 Nec Corp 半導体ウエ−ハの位置合せマ−クの形成方法
JPH0430414A (ja) * 1990-05-25 1992-02-03 Matsushita Electric Ind Co Ltd 位置決め装置
US5194744A (en) * 1990-05-25 1993-03-16 Matsushita Electric Industrial Co., Ltd. Compact reticle/wafer alignment system
JP2009533702A (ja) * 2006-04-11 2009-09-17 マイクロニック レーザー システムズ アクチボラゲット 位置合わせ方法及びそのための装置

Also Published As

Publication number Publication date
JPH0550128B2 (enrdf_load_stackoverflow) 1993-07-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term