JPS60132319A - 薄膜形成方法 - Google Patents
薄膜形成方法Info
- Publication number
- JPS60132319A JPS60132319A JP58240723A JP24072383A JPS60132319A JP S60132319 A JPS60132319 A JP S60132319A JP 58240723 A JP58240723 A JP 58240723A JP 24072383 A JP24072383 A JP 24072383A JP S60132319 A JPS60132319 A JP S60132319A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- target
- film
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/22—
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Photovoltaic Devices (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58240723A JPS60132319A (ja) | 1983-12-20 | 1983-12-20 | 薄膜形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58240723A JPS60132319A (ja) | 1983-12-20 | 1983-12-20 | 薄膜形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60132319A true JPS60132319A (ja) | 1985-07-15 |
| JPH0211011B2 JPH0211011B2 (OSRAM) | 1990-03-12 |
Family
ID=17063741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58240723A Granted JPS60132319A (ja) | 1983-12-20 | 1983-12-20 | 薄膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60132319A (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62216112A (ja) * | 1986-03-11 | 1987-09-22 | 田崎 明 | 透明導電膜の製造方法 |
| US5180476A (en) * | 1990-02-27 | 1993-01-19 | Nihon Shinku Gijutsu Kabushiki Kaisha | Method for producing transparent conductive films |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5440073A (en) * | 1977-09-05 | 1979-03-28 | Matsushita Electric Ind Co Ltd | Film forming method |
| JPS5616671A (en) * | 1979-07-17 | 1981-02-17 | Fujitsu Ltd | Sputtering apparatus |
| JPS57114662A (en) * | 1980-08-08 | 1982-07-16 | Battelle Development Corp | Cathode sputtering apparatus for detecting target drill hole |
| JPS58133376A (ja) * | 1982-01-26 | 1983-08-09 | マテリアルズ・リサ−チ・コ−ポレ−シヨン | 反応性膜析出方法及び装置 |
-
1983
- 1983-12-20 JP JP58240723A patent/JPS60132319A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5440073A (en) * | 1977-09-05 | 1979-03-28 | Matsushita Electric Ind Co Ltd | Film forming method |
| JPS5616671A (en) * | 1979-07-17 | 1981-02-17 | Fujitsu Ltd | Sputtering apparatus |
| JPS57114662A (en) * | 1980-08-08 | 1982-07-16 | Battelle Development Corp | Cathode sputtering apparatus for detecting target drill hole |
| JPS58133376A (ja) * | 1982-01-26 | 1983-08-09 | マテリアルズ・リサ−チ・コ−ポレ−シヨン | 反応性膜析出方法及び装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62216112A (ja) * | 1986-03-11 | 1987-09-22 | 田崎 明 | 透明導電膜の製造方法 |
| US5180476A (en) * | 1990-02-27 | 1993-01-19 | Nihon Shinku Gijutsu Kabushiki Kaisha | Method for producing transparent conductive films |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0211011B2 (OSRAM) | 1990-03-12 |
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