JPS60131963A - スパツタリング用タ−ゲツト板 - Google Patents

スパツタリング用タ−ゲツト板

Info

Publication number
JPS60131963A
JPS60131963A JP23992383A JP23992383A JPS60131963A JP S60131963 A JPS60131963 A JP S60131963A JP 23992383 A JP23992383 A JP 23992383A JP 23992383 A JP23992383 A JP 23992383A JP S60131963 A JPS60131963 A JP S60131963A
Authority
JP
Japan
Prior art keywords
pressure
powder
sintering
target plate
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23992383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0344145B2 (enrdf_load_stackoverflow
Inventor
Eiji Itou
伊藤　瑛二
Hideo Aoki
秀夫 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Kogyo KK
Eneos Corp
Original Assignee
Nihon Kogyo KK
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Kogyo KK, Nippon Mining Co Ltd filed Critical Nihon Kogyo KK
Priority to JP23992383A priority Critical patent/JPS60131963A/ja
Publication of JPS60131963A publication Critical patent/JPS60131963A/ja
Publication of JPH0344145B2 publication Critical patent/JPH0344145B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP23992383A 1983-12-21 1983-12-21 スパツタリング用タ−ゲツト板 Granted JPS60131963A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23992383A JPS60131963A (ja) 1983-12-21 1983-12-21 スパツタリング用タ−ゲツト板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23992383A JPS60131963A (ja) 1983-12-21 1983-12-21 スパツタリング用タ−ゲツト板

Publications (2)

Publication Number Publication Date
JPS60131963A true JPS60131963A (ja) 1985-07-13
JPH0344145B2 JPH0344145B2 (enrdf_load_stackoverflow) 1991-07-05

Family

ID=17051853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23992383A Granted JPS60131963A (ja) 1983-12-21 1983-12-21 スパツタリング用タ−ゲツト板

Country Status (1)

Country Link
JP (1) JPS60131963A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6213569A (ja) * 1985-07-10 1987-01-22 Mitsubishi Metal Corp ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト
JPS62148362A (ja) * 1985-12-24 1987-07-02 三菱マテリアル株式会社 スパツタリング用タ−ゲツト材の製造法
JPS6348632A (ja) * 1986-08-18 1988-03-01 Matsushita Electric Ind Co Ltd 光学情報記録再生デイスクの製造方法
JPS63143258A (ja) * 1986-12-05 1988-06-15 Mitsubishi Metal Corp スパツタリング用タ−ゲツト
JPH02170969A (ja) * 1988-12-23 1990-07-02 Mitsubishi Metal Corp ターゲット材の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6213569A (ja) * 1985-07-10 1987-01-22 Mitsubishi Metal Corp ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト
JPS62148362A (ja) * 1985-12-24 1987-07-02 三菱マテリアル株式会社 スパツタリング用タ−ゲツト材の製造法
JPS6348632A (ja) * 1986-08-18 1988-03-01 Matsushita Electric Ind Co Ltd 光学情報記録再生デイスクの製造方法
JPS63143258A (ja) * 1986-12-05 1988-06-15 Mitsubishi Metal Corp スパツタリング用タ−ゲツト
JPH02170969A (ja) * 1988-12-23 1990-07-02 Mitsubishi Metal Corp ターゲット材の製造方法

Also Published As

Publication number Publication date
JPH0344145B2 (enrdf_load_stackoverflow) 1991-07-05

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