JPS60130828A - レジストパタ−ンの形成方法 - Google Patents

レジストパタ−ンの形成方法

Info

Publication number
JPS60130828A
JPS60130828A JP58239295A JP23929583A JPS60130828A JP S60130828 A JPS60130828 A JP S60130828A JP 58239295 A JP58239295 A JP 58239295A JP 23929583 A JP23929583 A JP 23929583A JP S60130828 A JPS60130828 A JP S60130828A
Authority
JP
Japan
Prior art keywords
resist
ultraviolet rays
resist pattern
exposure
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58239295A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0458170B2 (Sortimente
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58239295A priority Critical patent/JPS60130828A/ja
Priority to US06/594,481 priority patent/US4609615A/en
Priority to DE8484302145T priority patent/DE3466741D1/de
Priority to EP84302145A priority patent/EP0124265B1/en
Priority to CA000450963A priority patent/CA1214679A/en
Publication of JPS60130828A publication Critical patent/JPS60130828A/ja
Publication of JPH0458170B2 publication Critical patent/JPH0458170B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58239295A 1983-03-31 1983-12-19 レジストパタ−ンの形成方法 Granted JPS60130828A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58239295A JPS60130828A (ja) 1983-12-19 1983-12-19 レジストパタ−ンの形成方法
US06/594,481 US4609615A (en) 1983-03-31 1984-03-27 Process for forming pattern with negative resist using quinone diazide compound
DE8484302145T DE3466741D1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
EP84302145A EP0124265B1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
CA000450963A CA1214679A (en) 1983-03-31 1984-03-30 Process for forming pattern with negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58239295A JPS60130828A (ja) 1983-12-19 1983-12-19 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS60130828A true JPS60130828A (ja) 1985-07-12
JPH0458170B2 JPH0458170B2 (Sortimente) 1992-09-16

Family

ID=17042603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58239295A Granted JPS60130828A (ja) 1983-03-31 1983-12-19 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS60130828A (Sortimente)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6278550A (ja) * 1985-07-18 1987-04-10 マイクロシィ・インコーポレーテッド 放射感受性フイルムの現像法
JPS62295420A (ja) * 1986-06-16 1987-12-22 Ushio Inc レジスト処理方法
JPS63198324A (ja) * 1987-02-13 1988-08-17 Toshiba Corp パタ−ン形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method
JPS56140345A (en) * 1980-04-02 1981-11-02 Hitachi Ltd Formation of pattern
JPS57153435A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method
JPS56140345A (en) * 1980-04-02 1981-11-02 Hitachi Ltd Formation of pattern
JPS57153435A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6278550A (ja) * 1985-07-18 1987-04-10 マイクロシィ・インコーポレーテッド 放射感受性フイルムの現像法
JPS62295420A (ja) * 1986-06-16 1987-12-22 Ushio Inc レジスト処理方法
JPS63198324A (ja) * 1987-02-13 1988-08-17 Toshiba Corp パタ−ン形成方法

Also Published As

Publication number Publication date
JPH0458170B2 (Sortimente) 1992-09-16

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term