JPS60125233A - 排ガスの高度処理方法 - Google Patents

排ガスの高度処理方法

Info

Publication number
JPS60125233A
JPS60125233A JP58230587A JP23058783A JPS60125233A JP S60125233 A JPS60125233 A JP S60125233A JP 58230587 A JP58230587 A JP 58230587A JP 23058783 A JP23058783 A JP 23058783A JP S60125233 A JPS60125233 A JP S60125233A
Authority
JP
Japan
Prior art keywords
gas
exhaust gas
silane
monosilane
high degree
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58230587A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0419886B2 (enExample
Inventor
Jun Saito
純 斉藤
Takatoshi Mitsuishi
三ツ石　隆俊
Hiroshi Waki
脇　浩
Hiroji Miyagawa
博治 宮川
Hiroshige Amita
裕茂 網田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP58230587A priority Critical patent/JPS60125233A/ja
Publication of JPS60125233A publication Critical patent/JPS60125233A/ja
Publication of JPH0419886B2 publication Critical patent/JPH0419886B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
JP58230587A 1983-12-08 1983-12-08 排ガスの高度処理方法 Granted JPS60125233A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58230587A JPS60125233A (ja) 1983-12-08 1983-12-08 排ガスの高度処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58230587A JPS60125233A (ja) 1983-12-08 1983-12-08 排ガスの高度処理方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP5018647A Division JPH0783820B2 (ja) 1993-02-05 1993-02-05 排ガスの高度処理方法
JP5018646A Division JPH0724738B2 (ja) 1993-02-05 1993-02-05 排ガスの高度処理剤

Publications (2)

Publication Number Publication Date
JPS60125233A true JPS60125233A (ja) 1985-07-04
JPH0419886B2 JPH0419886B2 (enExample) 1992-03-31

Family

ID=16910075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58230587A Granted JPS60125233A (ja) 1983-12-08 1983-12-08 排ガスの高度処理方法

Country Status (1)

Country Link
JP (1) JPS60125233A (enExample)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6190726A (ja) * 1984-10-12 1986-05-08 Nippon Paionikusu Kk 除去剤
JPS61129026A (ja) * 1984-11-27 1986-06-17 Nippon Paionikusu Kk 排ガスの浄化方法
JPS621439A (ja) * 1985-06-25 1987-01-07 Nippon Paionikusu Kk 有害成分の除去方法
JPS62286520A (ja) * 1986-06-03 1987-12-12 Japan Pionics Co Ltd 排ガスの浄化方法
JPS63137736A (ja) * 1986-11-28 1988-06-09 Asahi Glass Co Ltd エッチング排ガス除害方法
US5039321A (en) * 1988-11-04 1991-08-13 Toshiba Ceramics Co., Ltd. Apparatus for preventing clouding of a semiconductor wafer
JPH03241824A (ja) * 1990-02-20 1991-10-29 Fujitsu Ltd 減圧気相成長装置
WO1996004064A1 (en) * 1994-08-05 1996-02-15 Tadahiro Ohmi Hydride gas removing method and apparatus
JPH08168635A (ja) * 1995-09-21 1996-07-02 Japan Pionics Co Ltd 除去剤
EP1060783A1 (en) * 1999-06-16 2000-12-20 The BOC Group plc Semiconductor processing exhaust abatement
JP2007263678A (ja) * 2006-03-28 2007-10-11 Taiyo Nippon Sanso Corp 水素化物ガス中の微量不純物分析方法及び装置
CN112000059A (zh) * 2020-08-12 2020-11-27 北京国电龙源环保工程有限公司 一种氨在线分析仪自动控制系统及控制方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3789581A (en) * 1972-04-27 1974-02-05 Gulf Research Development Co Process for initial removal of sulfur compounds from gaseous hydrocarbon feedstocks before removal of arsenic therefrom
JPS5777627A (en) * 1980-10-31 1982-05-15 Osaka Sekiyu Kagaku Kk Removal of arsenic from hydrocarbon
JPS58122025A (ja) * 1982-01-13 1983-07-20 Showa Denko Kk ドライエツチング排ガスの処理方法
JPS58128146A (ja) * 1982-01-27 1983-07-30 Nippon Sanso Kk 吸収処理剤
JPS5949822A (ja) * 1982-09-14 1984-03-22 Nippon Sanso Kk 揮発性無機水素化物等を含有するガスの処理方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3789581A (en) * 1972-04-27 1974-02-05 Gulf Research Development Co Process for initial removal of sulfur compounds from gaseous hydrocarbon feedstocks before removal of arsenic therefrom
JPS5777627A (en) * 1980-10-31 1982-05-15 Osaka Sekiyu Kagaku Kk Removal of arsenic from hydrocarbon
JPS58122025A (ja) * 1982-01-13 1983-07-20 Showa Denko Kk ドライエツチング排ガスの処理方法
JPS58128146A (ja) * 1982-01-27 1983-07-30 Nippon Sanso Kk 吸収処理剤
JPS5949822A (ja) * 1982-09-14 1984-03-22 Nippon Sanso Kk 揮発性無機水素化物等を含有するガスの処理方法

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6190726A (ja) * 1984-10-12 1986-05-08 Nippon Paionikusu Kk 除去剤
JPS61129026A (ja) * 1984-11-27 1986-06-17 Nippon Paionikusu Kk 排ガスの浄化方法
JPS621439A (ja) * 1985-06-25 1987-01-07 Nippon Paionikusu Kk 有害成分の除去方法
JPS62286520A (ja) * 1986-06-03 1987-12-12 Japan Pionics Co Ltd 排ガスの浄化方法
JPS63137736A (ja) * 1986-11-28 1988-06-09 Asahi Glass Co Ltd エッチング排ガス除害方法
US5039321A (en) * 1988-11-04 1991-08-13 Toshiba Ceramics Co., Ltd. Apparatus for preventing clouding of a semiconductor wafer
JPH03241824A (ja) * 1990-02-20 1991-10-29 Fujitsu Ltd 減圧気相成長装置
WO1996004064A1 (en) * 1994-08-05 1996-02-15 Tadahiro Ohmi Hydride gas removing method and apparatus
JPH08168635A (ja) * 1995-09-21 1996-07-02 Japan Pionics Co Ltd 除去剤
EP1060783A1 (en) * 1999-06-16 2000-12-20 The BOC Group plc Semiconductor processing exhaust abatement
US6358485B1 (en) 1999-06-16 2002-03-19 The Boc Group Plc Semiconductor processing exhaust abatement
JP2007263678A (ja) * 2006-03-28 2007-10-11 Taiyo Nippon Sanso Corp 水素化物ガス中の微量不純物分析方法及び装置
CN112000059A (zh) * 2020-08-12 2020-11-27 北京国电龙源环保工程有限公司 一种氨在线分析仪自动控制系统及控制方法
CN112000059B (zh) * 2020-08-12 2022-03-15 国能龙源环保有限公司 一种氨在线分析仪自动控制系统及控制方法

Also Published As

Publication number Publication date
JPH0419886B2 (enExample) 1992-03-31

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