JPS60117243A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS60117243A
JPS60117243A JP22432883A JP22432883A JPS60117243A JP S60117243 A JPS60117243 A JP S60117243A JP 22432883 A JP22432883 A JP 22432883A JP 22432883 A JP22432883 A JP 22432883A JP S60117243 A JPS60117243 A JP S60117243A
Authority
JP
Japan
Prior art keywords
copolymer
alpha
resist material
resist
acrylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22432883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH052980B2 (enrdf_load_html_response
Inventor
Seiji Akimoto
誠司 秋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22432883A priority Critical patent/JPS60117243A/ja
Publication of JPS60117243A publication Critical patent/JPS60117243A/ja
Publication of JPH052980B2 publication Critical patent/JPH052980B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP22432883A 1983-11-30 1983-11-30 パタ−ン形成方法 Granted JPS60117243A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22432883A JPS60117243A (ja) 1983-11-30 1983-11-30 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22432883A JPS60117243A (ja) 1983-11-30 1983-11-30 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS60117243A true JPS60117243A (ja) 1985-06-24
JPH052980B2 JPH052980B2 (enrdf_load_html_response) 1993-01-13

Family

ID=16812031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22432883A Granted JPS60117243A (ja) 1983-11-30 1983-11-30 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS60117243A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190056664A1 (en) * 2016-01-29 2019-02-21 Zeon Corporation Polymer, positive resist composition, and method of forming resist pattern
KR20220031019A (ko) 2019-07-02 2022-03-11 오지 홀딩스 가부시키가이샤 레지스트 재료 및 패턴 형성 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859443A (ja) * 1981-10-06 1983-04-08 Toshiba Corp ポジ型放射線感応レジスト材料

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859443A (ja) * 1981-10-06 1983-04-08 Toshiba Corp ポジ型放射線感応レジスト材料

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190056664A1 (en) * 2016-01-29 2019-02-21 Zeon Corporation Polymer, positive resist composition, and method of forming resist pattern
KR20220031019A (ko) 2019-07-02 2022-03-11 오지 홀딩스 가부시키가이샤 레지스트 재료 및 패턴 형성 방법
KR20250005553A (ko) 2019-07-02 2025-01-09 오지 홀딩스 가부시키가이샤 레지스트 재료 및 패턴 형성 방법
US12248249B2 (en) 2019-07-02 2025-03-11 Oji Holdings Corporation Resist material and pattern forming method

Also Published As

Publication number Publication date
JPH052980B2 (enrdf_load_html_response) 1993-01-13

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