JPS60115268A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS60115268A JPS60115268A JP58222083A JP22208383A JPS60115268A JP S60115268 A JPS60115268 A JP S60115268A JP 58222083 A JP58222083 A JP 58222083A JP 22208383 A JP22208383 A JP 22208383A JP S60115268 A JPS60115268 A JP S60115268A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gate electrode
- insulating film
- mask
- silicide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58222083A JPS60115268A (ja) | 1983-11-28 | 1983-11-28 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58222083A JPS60115268A (ja) | 1983-11-28 | 1983-11-28 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60115268A true JPS60115268A (ja) | 1985-06-21 |
JPH0213929B2 JPH0213929B2 (enrdf_load_stackoverflow) | 1990-04-05 |
Family
ID=16776856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58222083A Granted JPS60115268A (ja) | 1983-11-28 | 1983-11-28 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60115268A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62260370A (ja) * | 1986-05-06 | 1987-11-12 | Hitachi Ltd | 電界効果トランジスタの製造方法 |
JPS647570A (en) * | 1987-01-12 | 1989-01-11 | Int Standard Electric Corp | Manufacture of self-aligning field effect transistor |
JPH01198079A (ja) * | 1988-02-02 | 1989-08-09 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5012985A (enrdf_load_stackoverflow) * | 1973-06-01 | 1975-02-10 | ||
JPS57152168A (en) * | 1981-03-13 | 1982-09-20 | Nec Corp | Manufacture of schottky barrier gate field effect transistor |
JPS57196581A (en) * | 1981-05-27 | 1982-12-02 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
-
1983
- 1983-11-28 JP JP58222083A patent/JPS60115268A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5012985A (enrdf_load_stackoverflow) * | 1973-06-01 | 1975-02-10 | ||
JPS57152168A (en) * | 1981-03-13 | 1982-09-20 | Nec Corp | Manufacture of schottky barrier gate field effect transistor |
JPS57196581A (en) * | 1981-05-27 | 1982-12-02 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62260370A (ja) * | 1986-05-06 | 1987-11-12 | Hitachi Ltd | 電界効果トランジスタの製造方法 |
JPS647570A (en) * | 1987-01-12 | 1989-01-11 | Int Standard Electric Corp | Manufacture of self-aligning field effect transistor |
JPH01198079A (ja) * | 1988-02-02 | 1989-08-09 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0213929B2 (enrdf_load_stackoverflow) | 1990-04-05 |
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