JPS60113436A - 半導体電着装置 - Google Patents

半導体電着装置

Info

Publication number
JPS60113436A
JPS60113436A JP58219397A JP21939783A JPS60113436A JP S60113436 A JPS60113436 A JP S60113436A JP 58219397 A JP58219397 A JP 58219397A JP 21939783 A JP21939783 A JP 21939783A JP S60113436 A JPS60113436 A JP S60113436A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
electrodeposition
semiconductor
electrode body
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58219397A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0455330B2 (enrdf_load_stackoverflow
Inventor
Toshio Ohira
大平　敏夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58219397A priority Critical patent/JPS60113436A/ja
Publication of JPS60113436A publication Critical patent/JPS60113436A/ja
Publication of JPH0455330B2 publication Critical patent/JPH0455330B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
JP58219397A 1983-11-24 1983-11-24 半導体電着装置 Granted JPS60113436A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58219397A JPS60113436A (ja) 1983-11-24 1983-11-24 半導体電着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58219397A JPS60113436A (ja) 1983-11-24 1983-11-24 半導体電着装置

Publications (2)

Publication Number Publication Date
JPS60113436A true JPS60113436A (ja) 1985-06-19
JPH0455330B2 JPH0455330B2 (enrdf_load_stackoverflow) 1992-09-03

Family

ID=16734770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58219397A Granted JPS60113436A (ja) 1983-11-24 1983-11-24 半導体電着装置

Country Status (1)

Country Link
JP (1) JPS60113436A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580325A (en) * 1978-12-13 1980-06-17 Toshiba Corp Apparatus for manufacturing semiconductor element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580325A (en) * 1978-12-13 1980-06-17 Toshiba Corp Apparatus for manufacturing semiconductor element

Also Published As

Publication number Publication date
JPH0455330B2 (enrdf_load_stackoverflow) 1992-09-03

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