JPS5994032A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS5994032A
JPS5994032A JP57204856A JP20485682A JPS5994032A JP S5994032 A JPS5994032 A JP S5994032A JP 57204856 A JP57204856 A JP 57204856A JP 20485682 A JP20485682 A JP 20485682A JP S5994032 A JPS5994032 A JP S5994032A
Authority
JP
Japan
Prior art keywords
projection
image
reticle
mark
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57204856A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0340934B2 (enrdf_load_stackoverflow
Inventor
Shoichi Tanimoto
昭一 谷元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP57204856A priority Critical patent/JPS5994032A/ja
Publication of JPS5994032A publication Critical patent/JPS5994032A/ja
Priority to US06/800,094 priority patent/US4629313A/en
Priority to US06/897,644 priority patent/US4711567A/en
Publication of JPH0340934B2 publication Critical patent/JPH0340934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP57204856A 1982-10-22 1982-11-22 投影露光装置 Granted JPS5994032A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57204856A JPS5994032A (ja) 1982-11-22 1982-11-22 投影露光装置
US06/800,094 US4629313A (en) 1982-10-22 1985-11-20 Exposure apparatus
US06/897,644 US4711567A (en) 1982-10-22 1986-08-18 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57204856A JPS5994032A (ja) 1982-11-22 1982-11-22 投影露光装置

Publications (2)

Publication Number Publication Date
JPS5994032A true JPS5994032A (ja) 1984-05-30
JPH0340934B2 JPH0340934B2 (enrdf_load_stackoverflow) 1991-06-20

Family

ID=16497526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57204856A Granted JPS5994032A (ja) 1982-10-22 1982-11-22 投影露光装置

Country Status (1)

Country Link
JP (1) JPS5994032A (enrdf_load_stackoverflow)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262421A (ja) * 1984-06-11 1985-12-25 Hitachi Ltd 投影露光方法およびその装置
JPS6153615A (ja) * 1984-08-24 1986-03-17 Canon Inc 面位置検出方法
US4585342A (en) * 1984-06-29 1986-04-29 International Business Machines Corporation System for real-time monitoring the characteristics, variations and alignment errors of lithography structures
JPS6358349A (ja) * 1986-08-29 1988-03-14 Nikon Corp 投影光学装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPH01149424A (ja) * 1987-12-04 1989-06-12 Fujitsu Ltd 投影露光の焦点合わせ補正方法
JPH07183210A (ja) * 1994-07-13 1995-07-21 Hitachi Ltd 投影露光装置
JPH0982628A (ja) * 1995-09-12 1997-03-28 Canon Inc 露光方法及び該方法を用いた露光装置
US6525817B1 (en) 1995-02-21 2003-02-25 Nikon Corporation Inspection method and apparatus for projection optical systems
JP2005316409A (ja) * 2004-03-29 2005-11-10 Fuji Photo Film Co Ltd 露光装置
JP2007535170A (ja) * 2004-04-28 2007-11-29 ライテル・インストルメンツ 動的走査フィールド湾曲の判定用装置及び方法
JP2008135745A (ja) * 2007-11-22 2008-06-12 Nikon Corp 波面収差測定機及び投影露光装置
JP2008538866A (ja) * 2005-04-25 2008-11-06 マイクロニック レーザー システムズ アクチボラゲット マイクロ・リソグラフィ・デフレクタ・システムの中でのマークの位置を測定するための方法
JP2017037194A (ja) * 2015-08-10 2017-02-16 キヤノン株式会社 露光装置の制御方法、露光装置、プログラム、および物品の製造方法
JP2019056830A (ja) * 2017-09-21 2019-04-11 キヤノン株式会社 決定方法、露光方法、プログラム、露光装置、および物品の製造方法

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262421A (ja) * 1984-06-11 1985-12-25 Hitachi Ltd 投影露光方法およびその装置
US4585342A (en) * 1984-06-29 1986-04-29 International Business Machines Corporation System for real-time monitoring the characteristics, variations and alignment errors of lithography structures
JPS6153615A (ja) * 1984-08-24 1986-03-17 Canon Inc 面位置検出方法
JPS6358349A (ja) * 1986-08-29 1988-03-14 Nikon Corp 投影光学装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPH01149424A (ja) * 1987-12-04 1989-06-12 Fujitsu Ltd 投影露光の焦点合わせ補正方法
JPH07183210A (ja) * 1994-07-13 1995-07-21 Hitachi Ltd 投影露光装置
US6525817B1 (en) 1995-02-21 2003-02-25 Nikon Corporation Inspection method and apparatus for projection optical systems
US6850327B2 (en) 1995-02-21 2005-02-01 Nikon Corporation Inspection method and apparatus for projection optical systems
JPH0982628A (ja) * 1995-09-12 1997-03-28 Canon Inc 露光方法及び該方法を用いた露光装置
JP2005316409A (ja) * 2004-03-29 2005-11-10 Fuji Photo Film Co Ltd 露光装置
JP2007535170A (ja) * 2004-04-28 2007-11-29 ライテル・インストルメンツ 動的走査フィールド湾曲の判定用装置及び方法
JP2008538866A (ja) * 2005-04-25 2008-11-06 マイクロニック レーザー システムズ アクチボラゲット マイクロ・リソグラフィ・デフレクタ・システムの中でのマークの位置を測定するための方法
JP2008135745A (ja) * 2007-11-22 2008-06-12 Nikon Corp 波面収差測定機及び投影露光装置
JP2017037194A (ja) * 2015-08-10 2017-02-16 キヤノン株式会社 露光装置の制御方法、露光装置、プログラム、および物品の製造方法
JP2019056830A (ja) * 2017-09-21 2019-04-11 キヤノン株式会社 決定方法、露光方法、プログラム、露光装置、および物品の製造方法

Also Published As

Publication number Publication date
JPH0340934B2 (enrdf_load_stackoverflow) 1991-06-20

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