JPH0340934B2 - - Google Patents

Info

Publication number
JPH0340934B2
JPH0340934B2 JP57204856A JP20485682A JPH0340934B2 JP H0340934 B2 JPH0340934 B2 JP H0340934B2 JP 57204856 A JP57204856 A JP 57204856A JP 20485682 A JP20485682 A JP 20485682A JP H0340934 B2 JPH0340934 B2 JP H0340934B2
Authority
JP
Japan
Prior art keywords
image
projection
stage
axis direction
optical axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57204856A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5994032A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57204856A priority Critical patent/JPS5994032A/ja
Publication of JPS5994032A publication Critical patent/JPS5994032A/ja
Priority to US06/800,094 priority patent/US4629313A/en
Priority to US06/897,644 priority patent/US4711567A/en
Publication of JPH0340934B2 publication Critical patent/JPH0340934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP57204856A 1982-10-22 1982-11-22 投影露光装置 Granted JPS5994032A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57204856A JPS5994032A (ja) 1982-11-22 1982-11-22 投影露光装置
US06/800,094 US4629313A (en) 1982-10-22 1985-11-20 Exposure apparatus
US06/897,644 US4711567A (en) 1982-10-22 1986-08-18 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57204856A JPS5994032A (ja) 1982-11-22 1982-11-22 投影露光装置

Publications (2)

Publication Number Publication Date
JPS5994032A JPS5994032A (ja) 1984-05-30
JPH0340934B2 true JPH0340934B2 (enrdf_load_stackoverflow) 1991-06-20

Family

ID=16497526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57204856A Granted JPS5994032A (ja) 1982-10-22 1982-11-22 投影露光装置

Country Status (1)

Country Link
JP (1) JPS5994032A (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
US4585342A (en) * 1984-06-29 1986-04-29 International Business Machines Corporation System for real-time monitoring the characteristics, variations and alignment errors of lithography structures
JPH068926B2 (ja) * 1984-08-24 1994-02-02 キヤノン株式会社 面位置検出方法
JPH0821531B2 (ja) * 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JP2569640B2 (ja) * 1987-12-04 1997-01-08 富士通株式会社 投影露光の焦点合わせ補正方法
JP2555274B2 (ja) * 1994-07-13 1996-11-20 株式会社日立製作所 投影露光装置
US6151122A (en) 1995-02-21 2000-11-21 Nikon Corporation Inspection method and apparatus for projection optical systems
JP3639648B2 (ja) * 1995-09-12 2005-04-20 キヤノン株式会社 露光方法及び該方法を用いた露光装置
JP4401308B2 (ja) * 2004-03-29 2010-01-20 富士フイルム株式会社 露光装置
US7126668B2 (en) * 2004-04-28 2006-10-24 Litel Instruments Apparatus and process for determination of dynamic scan field curvature
JP2008538866A (ja) * 2005-04-25 2008-11-06 マイクロニック レーザー システムズ アクチボラゲット マイクロ・リソグラフィ・デフレクタ・システムの中でのマークの位置を測定するための方法
JP2008135745A (ja) * 2007-11-22 2008-06-12 Nikon Corp 波面収差測定機及び投影露光装置
JP6588766B2 (ja) * 2015-08-10 2019-10-09 キヤノン株式会社 評価方法、露光方法、露光装置、プログラム、および物品の製造方法
JP6944323B2 (ja) * 2017-09-21 2021-10-06 キヤノン株式会社 計算方法、露光方法、プログラム、露光装置、および物品の製造方法

Also Published As

Publication number Publication date
JPS5994032A (ja) 1984-05-30

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