JPS5989535U - 半導体ウエハの洗浄装置 - Google Patents

半導体ウエハの洗浄装置

Info

Publication number
JPS5989535U
JPS5989535U JP18655882U JP18655882U JPS5989535U JP S5989535 U JPS5989535 U JP S5989535U JP 18655882 U JP18655882 U JP 18655882U JP 18655882 U JP18655882 U JP 18655882U JP S5989535 U JPS5989535 U JP S5989535U
Authority
JP
Japan
Prior art keywords
pure water
resistance
cleaning
water tank
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18655882U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6242535Y2 (enrdf_load_stackoverflow
Inventor
奥津　金之介
英一 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP18655882U priority Critical patent/JPS5989535U/ja
Publication of JPS5989535U publication Critical patent/JPS5989535U/ja
Application granted granted Critical
Publication of JPS6242535Y2 publication Critical patent/JPS6242535Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
JP18655882U 1982-12-09 1982-12-09 半導体ウエハの洗浄装置 Granted JPS5989535U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18655882U JPS5989535U (ja) 1982-12-09 1982-12-09 半導体ウエハの洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18655882U JPS5989535U (ja) 1982-12-09 1982-12-09 半導体ウエハの洗浄装置

Publications (2)

Publication Number Publication Date
JPS5989535U true JPS5989535U (ja) 1984-06-18
JPS6242535Y2 JPS6242535Y2 (enrdf_load_stackoverflow) 1987-10-31

Family

ID=30402932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18655882U Granted JPS5989535U (ja) 1982-12-09 1982-12-09 半導体ウエハの洗浄装置

Country Status (1)

Country Link
JP (1) JPS5989535U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0341729A (ja) * 1989-07-07 1991-02-22 Tokyo Electron Ltd 基板洗浄方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5274279A (en) * 1975-12-17 1977-06-22 Toshiba Corp Washing of semiconductor wafers
JPS5311957U (enrdf_load_stackoverflow) * 1976-07-13 1978-01-31

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5274279A (en) * 1975-12-17 1977-06-22 Toshiba Corp Washing of semiconductor wafers
JPS5311957U (enrdf_load_stackoverflow) * 1976-07-13 1978-01-31

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0341729A (ja) * 1989-07-07 1991-02-22 Tokyo Electron Ltd 基板洗浄方法

Also Published As

Publication number Publication date
JPS6242535Y2 (enrdf_load_stackoverflow) 1987-10-31

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