JPS5961073A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS5961073A JPS5961073A JP57171978A JP17197882A JPS5961073A JP S5961073 A JPS5961073 A JP S5961073A JP 57171978 A JP57171978 A JP 57171978A JP 17197882 A JP17197882 A JP 17197882A JP S5961073 A JPS5961073 A JP S5961073A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- compound semiconductor
- etching
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Drying Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57171978A JPS5961073A (ja) | 1982-09-29 | 1982-09-29 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57171978A JPS5961073A (ja) | 1982-09-29 | 1982-09-29 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5961073A true JPS5961073A (ja) | 1984-04-07 |
JPH0320063B2 JPH0320063B2 (enrdf_load_stackoverflow) | 1991-03-18 |
Family
ID=15933265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57171978A Granted JPS5961073A (ja) | 1982-09-29 | 1982-09-29 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5961073A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60244065A (ja) * | 1984-05-18 | 1985-12-03 | Fujitsu Ltd | ヘテロ接合バイポ−ラ半導体装置の製造方法 |
JPS61268060A (ja) * | 1985-05-23 | 1986-11-27 | Toshiba Corp | 半導体装置の製造方法 |
JPS6281767A (ja) * | 1985-10-07 | 1987-04-15 | Hitachi Ltd | 電界効果トランジスタ |
JPH0294663A (ja) * | 1988-09-30 | 1990-04-05 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51104269A (ja) * | 1975-03-12 | 1976-09-14 | Fujitsu Ltd | Purazumaetsuchinguhoho |
JPS5412573A (en) * | 1977-06-29 | 1979-01-30 | Matsushita Electric Ind Co Ltd | Junction type field effect transistor and production of the same |
JPS5515290A (en) * | 1978-07-20 | 1980-02-02 | Matsushita Electric Ind Co Ltd | Manufacturing method of semiconductor device |
-
1982
- 1982-09-29 JP JP57171978A patent/JPS5961073A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51104269A (ja) * | 1975-03-12 | 1976-09-14 | Fujitsu Ltd | Purazumaetsuchinguhoho |
JPS5412573A (en) * | 1977-06-29 | 1979-01-30 | Matsushita Electric Ind Co Ltd | Junction type field effect transistor and production of the same |
JPS5515290A (en) * | 1978-07-20 | 1980-02-02 | Matsushita Electric Ind Co Ltd | Manufacturing method of semiconductor device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60244065A (ja) * | 1984-05-18 | 1985-12-03 | Fujitsu Ltd | ヘテロ接合バイポ−ラ半導体装置の製造方法 |
JPS61268060A (ja) * | 1985-05-23 | 1986-11-27 | Toshiba Corp | 半導体装置の製造方法 |
JPS6281767A (ja) * | 1985-10-07 | 1987-04-15 | Hitachi Ltd | 電界効果トランジスタ |
JPH0294663A (ja) * | 1988-09-30 | 1990-04-05 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0320063B2 (enrdf_load_stackoverflow) | 1991-03-18 |
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