JPS594019A - パタ−ン比較検査方法 - Google Patents
パタ−ン比較検査方法Info
- Publication number
- JPS594019A JPS594019A JP57112779A JP11277982A JPS594019A JP S594019 A JPS594019 A JP S594019A JP 57112779 A JP57112779 A JP 57112779A JP 11277982 A JP11277982 A JP 11277982A JP S594019 A JPS594019 A JP S594019A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- wafer
- patterns
- reference pattern
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57112779A JPS594019A (ja) | 1982-06-30 | 1982-06-30 | パタ−ン比較検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57112779A JPS594019A (ja) | 1982-06-30 | 1982-06-30 | パタ−ン比較検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS594019A true JPS594019A (ja) | 1984-01-10 |
| JPH0258777B2 JPH0258777B2 (enrdf_load_stackoverflow) | 1990-12-10 |
Family
ID=14595279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57112779A Granted JPS594019A (ja) | 1982-06-30 | 1982-06-30 | パタ−ン比較検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS594019A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08339074A (ja) * | 1995-03-22 | 1996-12-24 | Hyundai Electron Ind Co Ltd | 露光マスクの製造方法 |
| US6767680B2 (en) | 2001-08-30 | 2004-07-27 | Advanced Micro Devices, Inc. | Semiconductor structure and method for determining critical dimensions and overlay error |
| US7099010B2 (en) | 2002-05-31 | 2006-08-29 | Advanced Micro Devices, Inc. | Two-dimensional structure for determining an overlay accuracy by means of scatterometry |
| US7307712B2 (en) | 2002-10-28 | 2007-12-11 | Asml Netherlands B.V. | Method of detecting mask defects, a computer program and reference substrate |
-
1982
- 1982-06-30 JP JP57112779A patent/JPS594019A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08339074A (ja) * | 1995-03-22 | 1996-12-24 | Hyundai Electron Ind Co Ltd | 露光マスクの製造方法 |
| US6767680B2 (en) | 2001-08-30 | 2004-07-27 | Advanced Micro Devices, Inc. | Semiconductor structure and method for determining critical dimensions and overlay error |
| US7099010B2 (en) | 2002-05-31 | 2006-08-29 | Advanced Micro Devices, Inc. | Two-dimensional structure for determining an overlay accuracy by means of scatterometry |
| US7307712B2 (en) | 2002-10-28 | 2007-12-11 | Asml Netherlands B.V. | Method of detecting mask defects, a computer program and reference substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0258777B2 (enrdf_load_stackoverflow) | 1990-12-10 |
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