JPS5934532A - 放射線感応性レジスト材料およびその製造方法 - Google Patents

放射線感応性レジスト材料およびその製造方法

Info

Publication number
JPS5934532A
JPS5934532A JP14433482A JP14433482A JPS5934532A JP S5934532 A JPS5934532 A JP S5934532A JP 14433482 A JP14433482 A JP 14433482A JP 14433482 A JP14433482 A JP 14433482A JP S5934532 A JPS5934532 A JP S5934532A
Authority
JP
Japan
Prior art keywords
ether
resist material
radiation
sensitive resist
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14433482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0376454B2 (enrdf_load_stackoverflow
Inventor
Teruo Fujimoto
藤本　輝雄
Yoshinobu Isono
善信 五十野
Mitsuru Nagasawa
永沢　満
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP14433482A priority Critical patent/JPS5934532A/ja
Publication of JPS5934532A publication Critical patent/JPS5934532A/ja
Publication of JPH0376454B2 publication Critical patent/JPH0376454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14433482A 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法 Granted JPS5934532A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14433482A JPS5934532A (ja) 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14433482A JPS5934532A (ja) 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法

Publications (2)

Publication Number Publication Date
JPS5934532A true JPS5934532A (ja) 1984-02-24
JPH0376454B2 JPH0376454B2 (enrdf_load_stackoverflow) 1991-12-05

Family

ID=15359690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14433482A Granted JPS5934532A (ja) 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法

Country Status (1)

Country Link
JP (1) JPS5934532A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5880240A (en) * 1996-04-03 1999-03-09 Arakawa Chemical Industries, Ltd. Alkyl-containing porous resin, process for its preparation and its use
EP0945764A3 (en) * 1998-03-26 2000-04-19 Sumitomo Chemical Company, Limited Photoresist composition
JP2010248283A (ja) * 2009-04-10 2010-11-04 Toyohashi Univ Of Technology 共重合体及び共重合体微粒子の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165141A (en) * 1980-05-26 1981-12-18 Univ Tohoku Resist material composition for working integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165141A (en) * 1980-05-26 1981-12-18 Univ Tohoku Resist material composition for working integrated circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5880240A (en) * 1996-04-03 1999-03-09 Arakawa Chemical Industries, Ltd. Alkyl-containing porous resin, process for its preparation and its use
EP0945764A3 (en) * 1998-03-26 2000-04-19 Sumitomo Chemical Company, Limited Photoresist composition
US6258507B1 (en) 1998-03-26 2001-07-10 Sumitomo Chemical Company, Limited Photoresist compositions
JP2010248283A (ja) * 2009-04-10 2010-11-04 Toyohashi Univ Of Technology 共重合体及び共重合体微粒子の製造方法

Also Published As

Publication number Publication date
JPH0376454B2 (enrdf_load_stackoverflow) 1991-12-05

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