JPS5929425A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5929425A
JPS5929425A JP57140046A JP14004682A JPS5929425A JP S5929425 A JPS5929425 A JP S5929425A JP 57140046 A JP57140046 A JP 57140046A JP 14004682 A JP14004682 A JP 14004682A JP S5929425 A JPS5929425 A JP S5929425A
Authority
JP
Japan
Prior art keywords
film
polycrystalline silicon
deposited
thickness
protection film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57140046A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0115137B2 (enExample
Inventor
Hiroyuki Okada
裕幸 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP57140046A priority Critical patent/JPS5929425A/ja
Publication of JPS5929425A publication Critical patent/JPS5929425A/ja
Publication of JPH0115137B2 publication Critical patent/JPH0115137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Landscapes

  • Formation Of Insulating Films (AREA)
JP57140046A 1982-08-11 1982-08-11 半導体装置の製造方法 Granted JPS5929425A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57140046A JPS5929425A (ja) 1982-08-11 1982-08-11 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57140046A JPS5929425A (ja) 1982-08-11 1982-08-11 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5929425A true JPS5929425A (ja) 1984-02-16
JPH0115137B2 JPH0115137B2 (enExample) 1989-03-15

Family

ID=15259715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57140046A Granted JPS5929425A (ja) 1982-08-11 1982-08-11 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5929425A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254735A (ja) * 1984-05-31 1985-12-16 Fujitsu Ltd 半導体装置
JPS6218041A (ja) * 1985-07-17 1987-01-27 Matsushita Electronics Corp 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254735A (ja) * 1984-05-31 1985-12-16 Fujitsu Ltd 半導体装置
JPS6218041A (ja) * 1985-07-17 1987-01-27 Matsushita Electronics Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH0115137B2 (enExample) 1989-03-15

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