JPS5928362A - 集積回路チップ支持基板のセラミック表面のきめを制御する方法 - Google Patents

集積回路チップ支持基板のセラミック表面のきめを制御する方法

Info

Publication number
JPS5928362A
JPS5928362A JP58087777A JP8777783A JPS5928362A JP S5928362 A JPS5928362 A JP S5928362A JP 58087777 A JP58087777 A JP 58087777A JP 8777783 A JP8777783 A JP 8777783A JP S5928362 A JPS5928362 A JP S5928362A
Authority
JP
Japan
Prior art keywords
layer
ceramic
ceramic substrate
substrate
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58087777A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6354221B2 (en:Method
Inventor
ジエ−ムズ・アンソニ−・ケアンズ
ジエ−ムズ・フランシス・ジ−グラ−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5928362A publication Critical patent/JPS5928362A/ja
Publication of JPS6354221B2 publication Critical patent/JPS6354221B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W42/00—Arrangements for protection of devices
    • H10W42/20—Arrangements for protection of devices protecting against electromagnetic or particle radiation, e.g. light, X-rays, gamma-rays or electrons
    • H10W42/25—Arrangements for protection of devices protecting against electromagnetic or particle radiation, e.g. light, X-rays, gamma-rays or electrons against alpha rays, e.g. for outer space applications
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • H10W70/692—Ceramics or glasses
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H10W72/07251—Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Wire Bonding (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP58087777A 1982-07-22 1983-05-20 集積回路チップ支持基板のセラミック表面のきめを制御する方法 Granted JPS5928362A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/400,813 US4528212A (en) 1982-07-22 1982-07-22 Coated ceramic substrates for mounting integrated circuits
US400813 1982-07-22

Publications (2)

Publication Number Publication Date
JPS5928362A true JPS5928362A (ja) 1984-02-15
JPS6354221B2 JPS6354221B2 (en:Method) 1988-10-27

Family

ID=23585136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58087777A Granted JPS5928362A (ja) 1982-07-22 1983-05-20 集積回路チップ支持基板のセラミック表面のきめを制御する方法

Country Status (4)

Country Link
US (1) US4528212A (en:Method)
EP (1) EP0099570B1 (en:Method)
JP (1) JPS5928362A (en:Method)
DE (1) DE3379522D1 (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013028679A (ja) * 2011-07-27 2013-02-07 Nitto Denko Corp 半導体装置製造用の接着シート、ダイシングフィルム一体型半導体装置製造用の接着シート、及び、当該半導体装置製造用の接着シートを有する半導体装置

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60204637A (ja) * 1984-03-19 1985-10-16 Nippon Electric Glass Co Ltd 低融点封着用組成物
JPS6148123A (ja) * 1984-08-15 1986-03-08 Sumitomo Special Metals Co Ltd 記録デイスク用基板の製造方法
US5165983A (en) * 1984-09-30 1992-11-24 Kabushiki Kaisha Toshiba Method for production of aluminum nitride ceramic plate
DE3674034D1 (de) * 1985-03-27 1990-10-18 Ibiden Co Ltd Substrate fuer elektronische schaltungen.
FR2584863B1 (fr) * 1985-07-12 1988-10-21 Inf Milit Spatiale Aeronaut Composant electronique durci vis-a-vis des radiations
JPS62120629A (ja) * 1985-11-20 1987-06-01 Sumitomo Special Metals Co Ltd 磁気ディスク及びその製造方法
US5165981A (en) * 1987-03-20 1992-11-24 Sumitomo Electric Industries, Ltd. Ceramic substrate and preparation of the same
US4832870A (en) * 1988-06-20 1989-05-23 The United States Department Of Energy Electrically conductive composite material
US4995947A (en) * 1988-06-29 1991-02-26 The United States Of America As Represented By The Department Of Energy Process for forming a metal compound coating on a substrate
FR2640428B1 (fr) * 1988-12-09 1992-10-30 Thomson Csf Procede de durcissement vis-a-vis des rayonnements ionisants de composants electroniques actifs, et composants durcis de grandes dimensions
US5316854A (en) * 1991-12-06 1994-05-31 Ppg Industries, Inc. Glass or quartz articles having high temperature UV absorbing coatings containing ceria
US5626943A (en) * 1994-06-02 1997-05-06 The Carborundum Company Ultra-smooth ceramic substrates and magnetic data storage media prepared therefrom
US5480695A (en) * 1994-08-10 1996-01-02 Tenhover; Michael A. Ceramic substrates and magnetic data storage components prepared therefrom
US6699450B2 (en) 1999-01-08 2004-03-02 Redunndant Materials, Inc. Carbide material by electromagnetic processing
US6545330B1 (en) 2000-07-12 2003-04-08 International Business Machines Corporation On chip alpha-particle detector

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5598846A (en) * 1979-01-22 1980-07-28 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device
JPS55163850A (en) * 1979-06-08 1980-12-20 Fujitsu Ltd Semiconductor device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2087632B (en) * 1977-11-01 1982-12-15 Atomic Energy Authority Uk Carbonaceous deposition reduction
US4230773A (en) * 1978-12-04 1980-10-28 International Business Machines Corporation Decreasing the porosity and surface roughness of ceramic substrates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5598846A (en) * 1979-01-22 1980-07-28 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device
JPS55163850A (en) * 1979-06-08 1980-12-20 Fujitsu Ltd Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013028679A (ja) * 2011-07-27 2013-02-07 Nitto Denko Corp 半導体装置製造用の接着シート、ダイシングフィルム一体型半導体装置製造用の接着シート、及び、当該半導体装置製造用の接着シートを有する半導体装置

Also Published As

Publication number Publication date
EP0099570B1 (en) 1989-03-29
US4528212A (en) 1985-07-09
DE3379522D1 (en) 1989-05-03
EP0099570A3 (en) 1986-01-22
JPS6354221B2 (en:Method) 1988-10-27
EP0099570A2 (en) 1984-02-01

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