JPS5925212B2 - 光学的複写機において物体表面及び／若しくは像表面を自動的に位置付けるための方法 - Google Patents

光学的複写機において物体表面及び／若しくは像表面を自動的に位置付けるための方法

Info

Publication number
JPS5925212B2
JPS5925212B2 JP50066647A JP6664775A JPS5925212B2 JP S5925212 B2 JPS5925212 B2 JP S5925212B2 JP 50066647 A JP50066647 A JP 50066647A JP 6664775 A JP6664775 A JP 6664775A JP S5925212 B2 JPS5925212 B2 JP S5925212B2
Authority
JP
Japan
Prior art keywords
semiconductor wafer
mask
plane
scanning
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50066647A
Other languages
English (en)
Japanese (ja)
Other versions
JPS516565A (enrdf_load_stackoverflow
Inventor
エルトマン コルス ハンス
フロシユ アルベルト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742427323 external-priority patent/DE2427323C2/de
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS516565A publication Critical patent/JPS516565A/ja
Publication of JPS5925212B2 publication Critical patent/JPS5925212B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Automatic Focus Adjustment (AREA)
  • Focusing (AREA)
JP50066647A 1974-06-06 1975-06-04 光学的複写機において物体表面及び／若しくは像表面を自動的に位置付けるための方法 Expired JPS5925212B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19742427323 DE2427323C2 (de) 1974-06-06 Verfahren zur automatischen Positionierung der Bild- und/oder Objektflächen bei optischen Kopiervorrichtungen
DE2427323 1974-06-06

Publications (2)

Publication Number Publication Date
JPS516565A JPS516565A (enrdf_load_stackoverflow) 1976-01-20
JPS5925212B2 true JPS5925212B2 (ja) 1984-06-15

Family

ID=5917467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50066647A Expired JPS5925212B2 (ja) 1974-06-06 1975-06-04 光学的複写機において物体表面及び／若しくは像表面を自動的に位置付けるための方法

Country Status (5)

Country Link
JP (1) JPS5925212B2 (enrdf_load_stackoverflow)
CA (1) CA1032382A (enrdf_load_stackoverflow)
FR (1) FR2274073A1 (enrdf_load_stackoverflow)
GB (1) GB1501908A (enrdf_load_stackoverflow)
IT (1) IT1037606B (enrdf_load_stackoverflow)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607764B2 (ja) * 1976-04-28 1985-02-27 キヤノン株式会社 走査型光検出装置
JPS53135653A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting optical device
JPS5532662A (en) * 1978-08-30 1980-03-07 Bando Chem Ind Ltd Stamp compound
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
US4383757A (en) 1979-04-02 1983-05-17 Optimetrix Corporation Optical focusing system
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
DE3070825D1 (en) * 1979-04-02 1985-08-08 Eaton Optimetrix Inc A system for positioning a utilization device
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
JPS5817446A (ja) * 1981-07-24 1983-02-01 Hitachi Ltd 投影露光方法および装置
JPS59100406A (ja) * 1982-11-30 1984-06-09 Asahi Optical Co Ltd 顕微鏡系における自動合焦装置
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置
JPS6174338A (ja) * 1984-09-20 1986-04-16 Hitachi Ltd 縮小投影露光装置およびその方法
JPS61221716A (ja) * 1985-01-22 1986-10-02 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 顕微鏡を用いる光学的検査装置の自動焦点装置
JP2622841B2 (ja) * 1987-09-24 1997-06-25 旭光学工業株式会社 露光装置
US5276725A (en) * 1988-05-10 1994-01-04 Canon Kabushiki Kaisha Exposure system
JP2799570B2 (ja) * 1988-05-10 1998-09-17 キヤノン株式会社 露光装置
JP2501053B2 (ja) * 1991-10-04 1996-05-29 株式会社日立製作所 紫外パルスレ―ザによる投影式露光方法
JPH0712019B2 (ja) * 1992-03-13 1995-02-08 株式会社日立製作所 投影露光方法及び投影露光装置
JP2530423B2 (ja) * 1994-04-22 1996-09-04 株式会社日立製作所 パタ−ン刻印装置
GB2414294B (en) * 2004-05-20 2006-08-02 Teraview Ltd Apparatus and method for investigating a sample
CN109947140B (zh) * 2019-04-03 2023-08-22 辽宁科技大学 一种5自由度激光准直微调装置及其调节方法

Also Published As

Publication number Publication date
CA1032382A (en) 1978-06-06
GB1501908A (en) 1978-02-22
DE2427323A1 (enrdf_load_stackoverflow) 1975-09-25
JPS516565A (enrdf_load_stackoverflow) 1976-01-20
FR2274073B1 (enrdf_load_stackoverflow) 1977-07-08
IT1037606B (it) 1979-11-20
DE2427323B1 (de) 1975-09-25
FR2274073A1 (fr) 1976-01-02

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