IT1037606B - Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati - Google Patents

Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati

Info

Publication number
IT1037606B
IT1037606B IT2270575A IT2270575A IT1037606B IT 1037606 B IT1037606 B IT 1037606B IT 2270575 A IT2270575 A IT 2270575A IT 2270575 A IT2270575 A IT 2270575A IT 1037606 B IT1037606 B IT 1037606B
Authority
IT
Italy
Prior art keywords
manufacture
integrated circuits
optical equipment
equipment useful
perfected
Prior art date
Application number
IT2270575A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742427323 external-priority patent/DE2427323C2/de
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1037606B publication Critical patent/IT1037606B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Automatic Focus Adjustment (AREA)
  • Focusing (AREA)
IT2270575A 1974-06-06 1975-04-24 Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati IT1037606B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742427323 DE2427323C2 (de) 1974-06-06 Verfahren zur automatischen Positionierung der Bild- und/oder Objektflächen bei optischen Kopiervorrichtungen

Publications (1)

Publication Number Publication Date
IT1037606B true IT1037606B (it) 1979-11-20

Family

ID=5917467

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2270575A IT1037606B (it) 1974-06-06 1975-04-24 Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati

Country Status (5)

Country Link
JP (1) JPS5925212B2 (it)
CA (1) CA1032382A (it)
FR (1) FR2274073A1 (it)
GB (1) GB1501908A (it)
IT (1) IT1037606B (it)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607764B2 (ja) * 1976-04-28 1985-02-27 キヤノン株式会社 走査型光検出装置
JPS53135653A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting optical device
JPS5532662A (en) * 1978-08-30 1980-03-07 Bando Chem Ind Ltd Stamp compound
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
EP0017044B1 (en) * 1979-04-02 1985-07-03 Eaton-Optimetrix Inc. A system for positioning a utilization device
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
JPS5817446A (ja) * 1981-07-24 1983-02-01 Hitachi Ltd 投影露光方法および装置
JPS59100406A (ja) * 1982-11-30 1984-06-09 Asahi Optical Co Ltd 顕微鏡系における自動合焦装置
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置
JPS6174338A (ja) * 1984-09-20 1986-04-16 Hitachi Ltd 縮小投影露光装置およびその方法
JPS61221716A (ja) * 1985-01-22 1986-10-02 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 顕微鏡を用いる光学的検査装置の自動焦点装置
JP2622841B2 (ja) * 1987-09-24 1997-06-25 旭光学工業株式会社 露光装置
US5276725A (en) * 1988-05-10 1994-01-04 Canon Kabushiki Kaisha Exposure system
JP2799570B2 (ja) * 1988-05-10 1998-09-17 キヤノン株式会社 露光装置
JP2501053B2 (ja) * 1991-10-04 1996-05-29 株式会社日立製作所 紫外パルスレ―ザによる投影式露光方法
JPH0712019B2 (ja) * 1992-03-13 1995-02-08 株式会社日立製作所 投影露光方法及び投影露光装置
JP2530423B2 (ja) * 1994-04-22 1996-09-04 株式会社日立製作所 パタ−ン刻印装置
GB2414294B (en) 2004-05-20 2006-08-02 Teraview Ltd Apparatus and method for investigating a sample
CN109947140B (zh) * 2019-04-03 2023-08-22 辽宁科技大学 一种5自由度激光准直微调装置及其调节方法

Also Published As

Publication number Publication date
GB1501908A (en) 1978-02-22
JPS5925212B2 (ja) 1984-06-15
FR2274073A1 (fr) 1976-01-02
CA1032382A (en) 1978-06-06
JPS516565A (ja) 1976-01-20
DE2427323B1 (de) 1975-09-25
DE2427323A1 (it) 1975-09-25
FR2274073B1 (it) 1977-07-08

Similar Documents

Publication Publication Date Title
IT1037606B (it) Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati
IT1115712B (it) Apparecchiatura perfezionata per la fabbricazione di circuiti integrati
IT1063394B (it) Procedimento perfezionato per la fabbricazione di circuiti integrati
IT1114870B (it) Processo e struttura per la connessione di circuiti elettrici
IT1036124B (it) Procedimento per la fabbricazione di abrasivi
IT1064451B (it) Procedimento per la fabbricazione di pannelli di circuiti stampati
IT1063554B (it) Procedimento per la fabbricazione di circuiti integrati
DK258975A (da) Fremgangsmade til fremstilling af benzimidazoler
IT1118012B (it) Processo perfezionato per la fabbricazione di circuiti integrati
IT1032591B (it) Procedimento per la fabbricazione di dispostivi semiconduttori
IT1063279B (it) Apparecchiatura per il trattamento di wafer o moduli semiconduttori
IT1106505B (it) Procedimento per la fabbricazione di dispositivi semiconduttori
IT1064171B (it) Procedimento per la fabbricazione di circuiti integrati
IT1079663B (it) Procedimento per la polimerizzazione di alcheni
IT1041472B (it) Dispositivo a fascio laser per la fabbricazione di circuiti integrati a semiconduttore
IT1047100B (it) Procedimento per la polimerizzazione di tetraidrofurano
IT1035172B (it) Procedimento per la fabricazione di specchi per ottica e pro dotto ottenuto
IT1043361B (it) Cibcuiti di alimentazione di elet comprendenti detti circuiti
IT1063602B (it) Procedimento perfezionato per la fabbricazione di circuiti integrati
IT1051692B (it) Procedimento per la fabbricazione di semiconduttori composti
IT1115463B (it) Apparecchiatura di interconnessione perfezionata
IT1090820B (it) Procedimento per la produzione di circuiti integrati e prodotto ottenuto
IT1031835B (it) Apparecchiatura di perforazione perfezionata
IT1041772B (it) Apparecchiatura pulitrice di nastro
IT1038616B (it) Procedimento per la fabricazione di alchilacetofenoni