JPS516565A - - Google Patents
Info
- Publication number
- JPS516565A JPS516565A JP50066647A JP6664775A JPS516565A JP S516565 A JPS516565 A JP S516565A JP 50066647 A JP50066647 A JP 50066647A JP 6664775 A JP6664775 A JP 6664775A JP S516565 A JPS516565 A JP S516565A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Automatic Focus Adjustment (AREA)
- Focusing (AREA)
- Projection-Type Copiers In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19742427323 DE2427323C2 (de) | 1974-06-06 | Verfahren zur automatischen Positionierung der Bild- und/oder Objektflächen bei optischen Kopiervorrichtungen | |
DE2427323 | 1974-06-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS516565A true JPS516565A (it) | 1976-01-20 |
JPS5925212B2 JPS5925212B2 (ja) | 1984-06-15 |
Family
ID=5917467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50066647A Expired JPS5925212B2 (ja) | 1974-06-06 | 1975-06-04 | 光学的複写機において物体表面及び/若しくは像表面を自動的に位置付けるための方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5925212B2 (it) |
CA (1) | CA1032382A (it) |
FR (1) | FR2274073A1 (it) |
GB (1) | GB1501908A (it) |
IT (1) | IT1037606B (it) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52132851A (en) * | 1976-04-28 | 1977-11-07 | Canon Inc | Optical detector of scanning type |
JPS53135653A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting optical device |
JPS5532662A (en) * | 1978-08-30 | 1980-03-07 | Bando Chem Ind Ltd | Stamp compound |
JPS5817446A (ja) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | 投影露光方法および装置 |
JPS59100406A (ja) * | 1982-11-30 | 1984-06-09 | Asahi Optical Co Ltd | 顕微鏡系における自動合焦装置 |
JPS6021051A (ja) * | 1983-07-14 | 1985-02-02 | Nippon Telegr & Teleph Corp <Ntt> | レンズ投影露光方法及び装置 |
JPS6174338A (ja) * | 1984-09-20 | 1986-04-16 | Hitachi Ltd | 縮小投影露光装置およびその方法 |
JPS61221716A (ja) * | 1985-01-22 | 1986-10-02 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | 顕微鏡を用いる光学的検査装置の自動焦点装置 |
JPS6481928A (en) * | 1987-09-24 | 1989-03-28 | Asahi Optical Co Ltd | Exposing device |
JPH0529193A (ja) * | 1991-10-04 | 1993-02-05 | Hitachi Ltd | 紫外パルスレーザによる投影式露光方法 |
JPH0574680A (ja) * | 1992-03-13 | 1993-03-26 | Hitachi Ltd | 投影露光方法 |
JPH06302489A (ja) * | 1994-04-22 | 1994-10-28 | Hitachi Ltd | パターン形成装置 |
JP2007538243A (ja) * | 2004-05-20 | 2007-12-27 | テラビュー リミテッド | 試料を調査するための装置及び方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2845603C2 (de) * | 1978-10-19 | 1982-12-09 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Verfahren und Einrichtung zum Projektionskopieren |
FR2450470A1 (fr) * | 1979-02-27 | 1980-09-26 | Thomson Csf | Systeme optique de projection en photorepetition |
DE3070825D1 (en) * | 1979-04-02 | 1985-08-08 | Eaton Optimetrix Inc | A system for positioning a utilization device |
US4540278A (en) * | 1979-04-02 | 1985-09-10 | Optimetrix Corporation | Optical focusing system |
US4232969A (en) * | 1979-05-30 | 1980-11-11 | International Business Machines Corporation | Projection optical system for aligning an image on a surface |
US5276725A (en) * | 1988-05-10 | 1994-01-04 | Canon Kabushiki Kaisha | Exposure system |
JP2799570B2 (ja) * | 1988-05-10 | 1998-09-17 | キヤノン株式会社 | 露光装置 |
CN109947140B (zh) * | 2019-04-03 | 2023-08-22 | 辽宁科技大学 | 一种5自由度激光准直微调装置及其调节方法 |
-
1975
- 1975-04-24 IT IT2270575A patent/IT1037606B/it active
- 1975-04-29 FR FR7514031A patent/FR2274073A1/fr active Granted
- 1975-05-07 GB GB1908675A patent/GB1501908A/en not_active Expired
- 1975-05-21 CA CA227,456A patent/CA1032382A/en not_active Expired
- 1975-06-04 JP JP50066647A patent/JPS5925212B2/ja not_active Expired
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS607764B2 (ja) * | 1976-04-28 | 1985-02-27 | キヤノン株式会社 | 走査型光検出装置 |
JPS52132851A (en) * | 1976-04-28 | 1977-11-07 | Canon Inc | Optical detector of scanning type |
JPS6337321B2 (it) * | 1977-05-01 | 1988-07-25 | Canon Kk | |
JPS53135653A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting optical device |
JPS5532662A (en) * | 1978-08-30 | 1980-03-07 | Bando Chem Ind Ltd | Stamp compound |
JPS5817446A (ja) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | 投影露光方法および装置 |
JPH0410209B2 (it) * | 1981-07-24 | 1992-02-24 | ||
JPS59100406A (ja) * | 1982-11-30 | 1984-06-09 | Asahi Optical Co Ltd | 顕微鏡系における自動合焦装置 |
JPS6021051A (ja) * | 1983-07-14 | 1985-02-02 | Nippon Telegr & Teleph Corp <Ntt> | レンズ投影露光方法及び装置 |
JPH037138B2 (it) * | 1983-07-14 | 1991-01-31 | Nippon Telegraph & Telephone | |
JPS6174338A (ja) * | 1984-09-20 | 1986-04-16 | Hitachi Ltd | 縮小投影露光装置およびその方法 |
JPH0564450B2 (it) * | 1984-09-20 | 1993-09-14 | Hitachi Ltd | |
JPS61221716A (ja) * | 1985-01-22 | 1986-10-02 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | 顕微鏡を用いる光学的検査装置の自動焦点装置 |
JPH0476450B2 (it) * | 1985-01-22 | 1992-12-03 | Kei Eru Ei Insutorumentsu Corp | |
JPS6481928A (en) * | 1987-09-24 | 1989-03-28 | Asahi Optical Co Ltd | Exposing device |
JPH0529193A (ja) * | 1991-10-04 | 1993-02-05 | Hitachi Ltd | 紫外パルスレーザによる投影式露光方法 |
JPH0574680A (ja) * | 1992-03-13 | 1993-03-26 | Hitachi Ltd | 投影露光方法 |
JPH06302489A (ja) * | 1994-04-22 | 1994-10-28 | Hitachi Ltd | パターン形成装置 |
JP2530423B2 (ja) * | 1994-04-22 | 1996-09-04 | 株式会社日立製作所 | パタ−ン刻印装置 |
JP2007538243A (ja) * | 2004-05-20 | 2007-12-27 | テラビュー リミテッド | 試料を調査するための装置及び方法 |
US8373126B2 (en) | 2004-05-20 | 2013-02-12 | Teraview Limited | Apparatus and method for investigating a sample |
Also Published As
Publication number | Publication date |
---|---|
GB1501908A (en) | 1978-02-22 |
DE2427323A1 (it) | 1975-09-25 |
DE2427323B1 (de) | 1975-09-25 |
JPS5925212B2 (ja) | 1984-06-15 |
FR2274073B1 (it) | 1977-07-08 |
CA1032382A (en) | 1978-06-06 |
IT1037606B (it) | 1979-11-20 |
FR2274073A1 (fr) | 1976-01-02 |