JPS6481928A - Exposing device - Google Patents

Exposing device

Info

Publication number
JPS6481928A
JPS6481928A JP23983287A JP23983287A JPS6481928A JP S6481928 A JPS6481928 A JP S6481928A JP 23983287 A JP23983287 A JP 23983287A JP 23983287 A JP23983287 A JP 23983287A JP S6481928 A JPS6481928 A JP S6481928A
Authority
JP
Japan
Prior art keywords
liquid crystal
pattern
exposure
crystal layer
mask film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23983287A
Other languages
Japanese (ja)
Other versions
JP2622841B2 (en
Inventor
Masatoshi Marui
Tomoaki Inage
Yuji Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pentax Corp
Original Assignee
Asahi Kogaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kogaku Kogyo Co Ltd filed Critical Asahi Kogaku Kogyo Co Ltd
Priority to JP62239832A priority Critical patent/JP2622841B2/en
Priority to US07/249,764 priority patent/US5026145A/en
Publication of JPS6481928A publication Critical patent/JPS6481928A/en
Priority to US07/616,657 priority patent/US5078474A/en
Priority to US07/616,385 priority patent/US5062692A/en
Application granted granted Critical
Publication of JP2622841B2 publication Critical patent/JP2622841B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)

Abstract

PURPOSE:To improve pattern accuracy and processing efficiency by exposing a photosensitive body layer along a circuit pattern without any mask film. CONSTITUTION:The temperature of a liquid crystal layer 15 is raised at a part irradiated with spot light for heating emitted by a writing optical system 20 to form a pattern consisting of a turbid part and a transparent part on the liquid crystal layer 15 by the thermooptic effect of the liquid crystal 15. Then luminous flux from a light source 31 for projection is passed through the liquid crystal layer 15 and projected on an object 40 of exposure and then there is less light incident from the turbid part than from the transparent part, so the object 40 of exposure can be exposed corresponding to this pattern. Thus, the exposure processing is performed without using any mask film, so there is no decrease in accuracy, the time for evacuation is not required, and the processing efficiency is improved.
JP62239832A 1987-09-24 1987-09-24 Exposure equipment Expired - Fee Related JP2622841B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62239832A JP2622841B2 (en) 1987-09-24 1987-09-24 Exposure equipment
US07/249,764 US5026145A (en) 1987-09-24 1988-09-26 Exposure apparatus
US07/616,657 US5078474A (en) 1987-09-24 1990-11-21 Exposure apparatus having a magnifying lens system
US07/616,385 US5062692A (en) 1987-09-24 1990-11-21 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62239832A JP2622841B2 (en) 1987-09-24 1987-09-24 Exposure equipment

Publications (2)

Publication Number Publication Date
JPS6481928A true JPS6481928A (en) 1989-03-28
JP2622841B2 JP2622841B2 (en) 1997-06-25

Family

ID=17050519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62239832A Expired - Fee Related JP2622841B2 (en) 1987-09-24 1987-09-24 Exposure equipment

Country Status (1)

Country Link
JP (1) JP2622841B2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516565A (en) * 1974-06-06 1976-01-20 Ibm
JPS6128927A (en) * 1984-07-20 1986-02-08 Nec Corp Method and device for liquid crystal thermal writing and projection display
JPS6244718A (en) * 1985-08-23 1987-02-26 Matsushita Electric Ind Co Ltd Pattern exposing device
JPS62198882A (en) * 1986-02-27 1987-09-02 Seiko Epson Corp Imaging printer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516565A (en) * 1974-06-06 1976-01-20 Ibm
JPS6128927A (en) * 1984-07-20 1986-02-08 Nec Corp Method and device for liquid crystal thermal writing and projection display
JPS6244718A (en) * 1985-08-23 1987-02-26 Matsushita Electric Ind Co Ltd Pattern exposing device
JPS62198882A (en) * 1986-02-27 1987-09-02 Seiko Epson Corp Imaging printer

Also Published As

Publication number Publication date
JP2622841B2 (en) 1997-06-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees