JPS59225522A - 集積回路の製造方法 - Google Patents

集積回路の製造方法

Info

Publication number
JPS59225522A
JPS59225522A JP58100219A JP10021983A JPS59225522A JP S59225522 A JPS59225522 A JP S59225522A JP 58100219 A JP58100219 A JP 58100219A JP 10021983 A JP10021983 A JP 10021983A JP S59225522 A JPS59225522 A JP S59225522A
Authority
JP
Japan
Prior art keywords
wafer
photomask
pattern
integrated circuit
photomasks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58100219A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0430173B2 (https=
Inventor
Shuetsu Kudo
工藤　修悦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58100219A priority Critical patent/JPS59225522A/ja
Publication of JPS59225522A publication Critical patent/JPS59225522A/ja
Publication of JPH0430173B2 publication Critical patent/JPH0430173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58100219A 1983-06-07 1983-06-07 集積回路の製造方法 Granted JPS59225522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58100219A JPS59225522A (ja) 1983-06-07 1983-06-07 集積回路の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58100219A JPS59225522A (ja) 1983-06-07 1983-06-07 集積回路の製造方法

Publications (2)

Publication Number Publication Date
JPS59225522A true JPS59225522A (ja) 1984-12-18
JPH0430173B2 JPH0430173B2 (https=) 1992-05-21

Family

ID=14268184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58100219A Granted JPS59225522A (ja) 1983-06-07 1983-06-07 集積回路の製造方法

Country Status (1)

Country Link
JP (1) JPS59225522A (https=)

Also Published As

Publication number Publication date
JPH0430173B2 (https=) 1992-05-21

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