JPS59208838A - マイクロ波プラズマ処理装置 - Google Patents

マイクロ波プラズマ処理装置

Info

Publication number
JPS59208838A
JPS59208838A JP58084489A JP8448983A JPS59208838A JP S59208838 A JPS59208838 A JP S59208838A JP 58084489 A JP58084489 A JP 58084489A JP 8448983 A JP8448983 A JP 8448983A JP S59208838 A JPS59208838 A JP S59208838A
Authority
JP
Japan
Prior art keywords
microwave
plasma
sample
waveguide
transmission window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58084489A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0247851B2 (enrdf_load_stackoverflow
Inventor
Shuzo Fujimura
藤村　修三
Toshimasa Kisa
木佐　俊正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58084489A priority Critical patent/JPS59208838A/ja
Publication of JPS59208838A publication Critical patent/JPS59208838A/ja
Publication of JPH0247851B2 publication Critical patent/JPH0247851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP58084489A 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置 Granted JPS59208838A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58084489A JPS59208838A (ja) 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58084489A JPS59208838A (ja) 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS59208838A true JPS59208838A (ja) 1984-11-27
JPH0247851B2 JPH0247851B2 (enrdf_load_stackoverflow) 1990-10-23

Family

ID=13832063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58084489A Granted JPS59208838A (ja) 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS59208838A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222638A (ja) * 1986-03-20 1987-09-30 Fujitsu Ltd マイクロ波プラズマ処理装置
US5961775A (en) * 1987-08-19 1999-10-05 Fujitsu Limited Apparatus for removing organic resist from semiconductor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04192848A (ja) * 1990-11-27 1992-07-13 Iwatsu Electric Co Ltd 電話装置の着信回路

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222638A (ja) * 1986-03-20 1987-09-30 Fujitsu Ltd マイクロ波プラズマ処理装置
US5961775A (en) * 1987-08-19 1999-10-05 Fujitsu Limited Apparatus for removing organic resist from semiconductor

Also Published As

Publication number Publication date
JPH0247851B2 (enrdf_load_stackoverflow) 1990-10-23

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