JPH0247851B2 - - Google Patents

Info

Publication number
JPH0247851B2
JPH0247851B2 JP58084489A JP8448983A JPH0247851B2 JP H0247851 B2 JPH0247851 B2 JP H0247851B2 JP 58084489 A JP58084489 A JP 58084489A JP 8448983 A JP8448983 A JP 8448983A JP H0247851 B2 JPH0247851 B2 JP H0247851B2
Authority
JP
Japan
Prior art keywords
plasma
microwave
transmission window
waveguide
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58084489A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59208838A (ja
Inventor
Shuzo Fujimura
Toshimasa Kisa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58084489A priority Critical patent/JPS59208838A/ja
Publication of JPS59208838A publication Critical patent/JPS59208838A/ja
Publication of JPH0247851B2 publication Critical patent/JPH0247851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP58084489A 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置 Granted JPS59208838A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58084489A JPS59208838A (ja) 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58084489A JPS59208838A (ja) 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS59208838A JPS59208838A (ja) 1984-11-27
JPH0247851B2 true JPH0247851B2 (enrdf_load_stackoverflow) 1990-10-23

Family

ID=13832063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58084489A Granted JPS59208838A (ja) 1983-05-13 1983-05-13 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS59208838A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04192848A (ja) * 1990-11-27 1992-07-13 Iwatsu Electric Co Ltd 電話装置の着信回路

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222638A (ja) * 1986-03-20 1987-09-30 Fujitsu Ltd マイクロ波プラズマ処理装置
JPH0777211B2 (ja) * 1987-08-19 1995-08-16 富士通株式会社 アッシング方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04192848A (ja) * 1990-11-27 1992-07-13 Iwatsu Electric Co Ltd 電話装置の着信回路

Also Published As

Publication number Publication date
JPS59208838A (ja) 1984-11-27

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