JPH0352217B2 - - Google Patents

Info

Publication number
JPH0352217B2
JPH0352217B2 JP58134030A JP13403083A JPH0352217B2 JP H0352217 B2 JPH0352217 B2 JP H0352217B2 JP 58134030 A JP58134030 A JP 58134030A JP 13403083 A JP13403083 A JP 13403083A JP H0352217 B2 JPH0352217 B2 JP H0352217B2
Authority
JP
Japan
Prior art keywords
plasma
transmission window
gas
wall
generation chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58134030A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6025234A (ja
Inventor
Shuzo Fujimura
Hiroshi Yano
Toshimasa Kisa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13403083A priority Critical patent/JPS6025234A/ja
Publication of JPS6025234A publication Critical patent/JPS6025234A/ja
Publication of JPH0352217B2 publication Critical patent/JPH0352217B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP13403083A 1983-07-21 1983-07-21 マイクロ波プラズマ処理装置 Granted JPS6025234A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13403083A JPS6025234A (ja) 1983-07-21 1983-07-21 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13403083A JPS6025234A (ja) 1983-07-21 1983-07-21 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS6025234A JPS6025234A (ja) 1985-02-08
JPH0352217B2 true JPH0352217B2 (enrdf_load_stackoverflow) 1991-08-09

Family

ID=15118732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13403083A Granted JPS6025234A (ja) 1983-07-21 1983-07-21 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS6025234A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222638A (ja) * 1986-03-20 1987-09-30 Fujitsu Ltd マイクロ波プラズマ処理装置
JPS62264623A (ja) * 1986-05-13 1987-11-17 Fujitsu Ltd マイクロ波プラズマ処理装置
JPH0770522B2 (ja) * 1987-03-06 1995-07-31 株式会社日立製作所 プラズマ処理装置
JPH0475787A (ja) * 1990-07-13 1992-03-10 Sumitomo Metal Ind Ltd 形鋼または鋼管溶接の入熱制御方法
JP2013186970A (ja) * 2012-03-06 2013-09-19 Ulvac Japan Ltd プラズマ処理装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58202532A (ja) * 1982-05-21 1983-11-25 Hitachi Ltd マイクロ波プラズマ放電管

Also Published As

Publication number Publication date
JPS6025234A (ja) 1985-02-08

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