JPS59203791A - 単結晶シリコン膜形成法 - Google Patents
単結晶シリコン膜形成法Info
- Publication number
- JPS59203791A JPS59203791A JP58074002A JP7400283A JPS59203791A JP S59203791 A JPS59203791 A JP S59203791A JP 58074002 A JP58074002 A JP 58074002A JP 7400283 A JP7400283 A JP 7400283A JP S59203791 A JPS59203791 A JP S59203791A
- Authority
- JP
- Japan
- Prior art keywords
- groove
- silicon film
- film
- substrate
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
- C30B13/24—Heating of the molten zone by irradiation or electric discharge using electromagnetic waves
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58074002A JPS59203791A (ja) | 1983-04-28 | 1983-04-28 | 単結晶シリコン膜形成法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58074002A JPS59203791A (ja) | 1983-04-28 | 1983-04-28 | 単結晶シリコン膜形成法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59203791A true JPS59203791A (ja) | 1984-11-17 |
| JPH0228560B2 JPH0228560B2 (enExample) | 1990-06-25 |
Family
ID=13534428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58074002A Granted JPS59203791A (ja) | 1983-04-28 | 1983-04-28 | 単結晶シリコン膜形成法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59203791A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2580673A1 (fr) * | 1985-04-19 | 1986-10-24 | Haond Michel | Procede de fabrication sur un support isolant d'un film de silicium monocristallin oriente et a defauts localises |
| JPS62176978A (ja) * | 1985-08-30 | 1987-08-03 | Agency Of Ind Science & Technol | 結晶成長用基板およびその製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0337259U (enExample) * | 1989-08-23 | 1991-04-11 |
-
1983
- 1983-04-28 JP JP58074002A patent/JPS59203791A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2580673A1 (fr) * | 1985-04-19 | 1986-10-24 | Haond Michel | Procede de fabrication sur un support isolant d'un film de silicium monocristallin oriente et a defauts localises |
| JPS62176978A (ja) * | 1985-08-30 | 1987-08-03 | Agency Of Ind Science & Technol | 結晶成長用基板およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0228560B2 (enExample) | 1990-06-25 |
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