JPS59190360A - 真空蒸着メツキ用蒸着鍋の浮遊異物除去装置 - Google Patents
真空蒸着メツキ用蒸着鍋の浮遊異物除去装置Info
- Publication number
- JPS59190360A JPS59190360A JP6229083A JP6229083A JPS59190360A JP S59190360 A JPS59190360 A JP S59190360A JP 6229083 A JP6229083 A JP 6229083A JP 6229083 A JP6229083 A JP 6229083A JP S59190360 A JPS59190360 A JP S59190360A
- Authority
- JP
- Japan
- Prior art keywords
- foreign matter
- plating
- plating material
- vapor
- pan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6229083A JPS59190360A (ja) | 1983-04-11 | 1983-04-11 | 真空蒸着メツキ用蒸着鍋の浮遊異物除去装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6229083A JPS59190360A (ja) | 1983-04-11 | 1983-04-11 | 真空蒸着メツキ用蒸着鍋の浮遊異物除去装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59190360A true JPS59190360A (ja) | 1984-10-29 |
JPH0252717B2 JPH0252717B2 (enrdf_load_stackoverflow) | 1990-11-14 |
Family
ID=13195835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6229083A Granted JPS59190360A (ja) | 1983-04-11 | 1983-04-11 | 真空蒸着メツキ用蒸着鍋の浮遊異物除去装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59190360A (enrdf_load_stackoverflow) |
-
1983
- 1983-04-11 JP JP6229083A patent/JPS59190360A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0252717B2 (enrdf_load_stackoverflow) | 1990-11-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2977896B2 (ja) | 低温装置 | |
JP3347814B2 (ja) | 基板の洗浄・乾燥処理方法並びにその処理装置 | |
JPH084063B2 (ja) | 半導体基板の保存方法 | |
US6085827A (en) | Method for the directed solidification of molten metal and a casting apparatus for the practice thereof | |
US4290439A (en) | Device for cleaning mechanical parts | |
JPH0734209A (ja) | 連続溶融めっき方法及びその方法に使用するドロス除去装置 | |
JPH0620618B2 (ja) | 連続鋳造方法及びその装置 | |
JPS59190360A (ja) | 真空蒸着メツキ用蒸着鍋の浮遊異物除去装置 | |
KR20220042457A (ko) | 이동가능한 오버플로 | |
US3396778A (en) | Apparatus for cast cladding | |
JP2646816B2 (ja) | 溶融亜鉛めっきにおけるドロスの徐去方法 | |
JPH05279827A (ja) | 溶融金属めっきにおけるスナウト内ドロス除去装置 | |
JP2501654B2 (ja) | 連続溶融亜鉛めっき装置 | |
JPS60135568A (ja) | 真空蒸着装置 | |
JPS59190361A (ja) | 真空蒸着装置 | |
KR200363077Y1 (ko) | 스나우트 내부의 탕면 이물질제거장치 | |
JPH09314316A (ja) | 溶鋼鍋内の付着物除去方法 | |
JPH0437131A (ja) | 半導体ウエハの純水水洗槽及び水洗方法 | |
JPS59177368A (ja) | 真空蒸着装置 | |
JPS58224166A (ja) | 連続真空蒸着装置 | |
JPH0211747A (ja) | 連続溶融亜鉛めっき装置 | |
JPS59113178A (ja) | 真空蒸着装置 | |
JP2003075067A (ja) | 基板の洗浄・乾燥処理装置 | |
JP3348053B2 (ja) | 基板の洗浄・乾燥処理方法ならびにその処理装置 | |
JP2003031543A (ja) | 基板の洗浄・乾燥処理装置 |