JPS5917260A - 半導体ウエハの試験方法 - Google Patents
半導体ウエハの試験方法Info
- Publication number
- JPS5917260A JPS5917260A JP57128681A JP12868182A JPS5917260A JP S5917260 A JPS5917260 A JP S5917260A JP 57128681 A JP57128681 A JP 57128681A JP 12868182 A JP12868182 A JP 12868182A JP S5917260 A JPS5917260 A JP S5917260A
- Authority
- JP
- Japan
- Prior art keywords
- probe
- image
- semiconductor wafer
- semiconductor
- chuck top
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P74/00—
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57128681A JPS5917260A (ja) | 1982-07-20 | 1982-07-20 | 半導体ウエハの試験方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57128681A JPS5917260A (ja) | 1982-07-20 | 1982-07-20 | 半導体ウエハの試験方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5917260A true JPS5917260A (ja) | 1984-01-28 |
| JPS6231825B2 JPS6231825B2 (enExample) | 1987-07-10 |
Family
ID=14990799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57128681A Granted JPS5917260A (ja) | 1982-07-20 | 1982-07-20 | 半導体ウエハの試験方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5917260A (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60213040A (ja) * | 1984-04-09 | 1985-10-25 | Hitachi Ltd | ウエ−ハプロ−バ装置 |
| JPS622250U (enExample) * | 1985-06-20 | 1987-01-08 | ||
| JPH01121778A (ja) * | 1987-11-04 | 1989-05-15 | Tokyo Electron Ltd | プローブ装置及び液晶パネル用プローブ装置 |
| JPH0388349A (ja) * | 1989-08-30 | 1991-04-12 | Nec Yamagata Ltd | プロービング装置 |
| US6917698B2 (en) | 2000-11-09 | 2005-07-12 | Tokyo Electron Limited | Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
| JP2007184538A (ja) * | 2005-12-09 | 2007-07-19 | Nec Electronics Corp | プローブ検査装置 |
| JP2008166806A (ja) * | 2006-12-27 | 2008-07-17 | Suss Microtec Test Systems Gmbh | プロービング装置で焦点を合わせて多平面画像を取得する装置と方法 |
| CN113053765A (zh) * | 2021-03-08 | 2021-06-29 | 常州雷射激光设备有限公司 | 一种用于半导体二极管芯片的检测设备 |
-
1982
- 1982-07-20 JP JP57128681A patent/JPS5917260A/ja active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60213040A (ja) * | 1984-04-09 | 1985-10-25 | Hitachi Ltd | ウエ−ハプロ−バ装置 |
| JPS622250U (enExample) * | 1985-06-20 | 1987-01-08 | ||
| JPH01121778A (ja) * | 1987-11-04 | 1989-05-15 | Tokyo Electron Ltd | プローブ装置及び液晶パネル用プローブ装置 |
| JPH0388349A (ja) * | 1989-08-30 | 1991-04-12 | Nec Yamagata Ltd | プロービング装置 |
| US6917698B2 (en) | 2000-11-09 | 2005-07-12 | Tokyo Electron Limited | Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
| US7382914B2 (en) | 2000-11-09 | 2008-06-03 | Tokyo Electron Limited | Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
| JP2007184538A (ja) * | 2005-12-09 | 2007-07-19 | Nec Electronics Corp | プローブ検査装置 |
| JP2008166806A (ja) * | 2006-12-27 | 2008-07-17 | Suss Microtec Test Systems Gmbh | プロービング装置で焦点を合わせて多平面画像を取得する装置と方法 |
| CN113053765A (zh) * | 2021-03-08 | 2021-06-29 | 常州雷射激光设备有限公司 | 一种用于半导体二极管芯片的检测设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6231825B2 (enExample) | 1987-07-10 |
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