JPS59165461A - ショットキ接合形化合物半導体電界効果トランジスタの製造方法 - Google Patents
ショットキ接合形化合物半導体電界効果トランジスタの製造方法Info
- Publication number
- JPS59165461A JPS59165461A JP58038166A JP3816683A JPS59165461A JP S59165461 A JPS59165461 A JP S59165461A JP 58038166 A JP58038166 A JP 58038166A JP 3816683 A JP3816683 A JP 3816683A JP S59165461 A JPS59165461 A JP S59165461A
- Authority
- JP
- Japan
- Prior art keywords
- compound semiconductor
- schottky junction
- insulating film
- effect transistor
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
Landscapes
- Junction Field-Effect Transistors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58038166A JPS59165461A (ja) | 1983-03-10 | 1983-03-10 | ショットキ接合形化合物半導体電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58038166A JPS59165461A (ja) | 1983-03-10 | 1983-03-10 | ショットキ接合形化合物半導体電界効果トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59165461A true JPS59165461A (ja) | 1984-09-18 |
JPS6323666B2 JPS6323666B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-05-17 |
Family
ID=12517812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58038166A Granted JPS59165461A (ja) | 1983-03-10 | 1983-03-10 | ショットキ接合形化合物半導体電界効果トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59165461A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61258480A (ja) * | 1985-03-20 | 1986-11-15 | インタ−ナシヨナル・スタンダ−ド・エレクトリツク・コ−ポレイシヨン | 接合型電界効果トランジスタおよびその製造方法 |
JPS6239076A (ja) * | 1985-08-14 | 1987-02-20 | Nec Corp | 電界効果トランジスタの製造方法 |
JPS6260268A (ja) * | 1985-09-10 | 1987-03-16 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタの製造方法 |
US6472303B1 (en) | 2001-10-08 | 2002-10-29 | Hynix Semiconductor Inc. | Method of forming a contact plug for a semiconductor device |
US6541355B2 (en) | 2001-09-05 | 2003-04-01 | Hynix Semiconductor Inc. | Method of selective epitaxial growth for semiconductor devices |
US6818537B2 (en) | 2001-10-08 | 2004-11-16 | Hynix Semiconductor Inc. | Method of manufacturing a contact plug for a semiconductor device |
US6933228B2 (en) | 2001-10-12 | 2005-08-23 | Hynix Semiconductor Inc. | Method of manufacturing of contact plug in a contact hole on a silicon substrate |
JP2017527988A (ja) * | 2014-08-13 | 2017-09-21 | インテル・コーポレーション | 自己整合ゲートラストiii−nトランジスタ |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5039879A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-08-13 | 1975-04-12 | ||
JPS57133682A (en) * | 1980-12-24 | 1982-08-18 | Philips Nv | Method of producing field effect transistor |
-
1983
- 1983-03-10 JP JP58038166A patent/JPS59165461A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5039879A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-08-13 | 1975-04-12 | ||
JPS57133682A (en) * | 1980-12-24 | 1982-08-18 | Philips Nv | Method of producing field effect transistor |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61258480A (ja) * | 1985-03-20 | 1986-11-15 | インタ−ナシヨナル・スタンダ−ド・エレクトリツク・コ−ポレイシヨン | 接合型電界効果トランジスタおよびその製造方法 |
JPS6239076A (ja) * | 1985-08-14 | 1987-02-20 | Nec Corp | 電界効果トランジスタの製造方法 |
JPS6260268A (ja) * | 1985-09-10 | 1987-03-16 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタの製造方法 |
US6541355B2 (en) | 2001-09-05 | 2003-04-01 | Hynix Semiconductor Inc. | Method of selective epitaxial growth for semiconductor devices |
US6472303B1 (en) | 2001-10-08 | 2002-10-29 | Hynix Semiconductor Inc. | Method of forming a contact plug for a semiconductor device |
US6818537B2 (en) | 2001-10-08 | 2004-11-16 | Hynix Semiconductor Inc. | Method of manufacturing a contact plug for a semiconductor device |
USRE45232E1 (en) | 2001-10-08 | 2014-11-04 | Conversant Ip N.B. 868 Inc. | Method of forming a contact plug for a semiconductor device |
US6933228B2 (en) | 2001-10-12 | 2005-08-23 | Hynix Semiconductor Inc. | Method of manufacturing of contact plug in a contact hole on a silicon substrate |
JP2017527988A (ja) * | 2014-08-13 | 2017-09-21 | インテル・コーポレーション | 自己整合ゲートラストiii−nトランジスタ |
Also Published As
Publication number | Publication date |
---|---|
JPS6323666B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-05-17 |