JPS5916329A - プラズマ気相反応装置 - Google Patents

プラズマ気相反応装置

Info

Publication number
JPS5916329A
JPS5916329A JP57126049A JP12604982A JPS5916329A JP S5916329 A JPS5916329 A JP S5916329A JP 57126049 A JP57126049 A JP 57126049A JP 12604982 A JP12604982 A JP 12604982A JP S5916329 A JPS5916329 A JP S5916329A
Authority
JP
Japan
Prior art keywords
reaction vessel
reaction
semiconductor layer
substrate
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57126049A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0522375B2 (en:Method
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP57126049A priority Critical patent/JPS5916329A/ja
Publication of JPS5916329A publication Critical patent/JPS5916329A/ja
Publication of JPH0522375B2 publication Critical patent/JPH0522375B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • H10P14/24—
    • H10P14/3408—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
JP57126049A 1982-07-19 1982-07-19 プラズマ気相反応装置 Granted JPS5916329A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57126049A JPS5916329A (ja) 1982-07-19 1982-07-19 プラズマ気相反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57126049A JPS5916329A (ja) 1982-07-19 1982-07-19 プラズマ気相反応装置

Publications (2)

Publication Number Publication Date
JPS5916329A true JPS5916329A (ja) 1984-01-27
JPH0522375B2 JPH0522375B2 (en:Method) 1993-03-29

Family

ID=14925378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57126049A Granted JPS5916329A (ja) 1982-07-19 1982-07-19 プラズマ気相反応装置

Country Status (1)

Country Link
JP (1) JPS5916329A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0620971A (ja) * 1992-06-30 1994-01-28 Canon Inc 堆積膜形成方法、光起電力素子、及び光起電力素子の連続的製造方法
US5326404A (en) * 1991-12-19 1994-07-05 Sony Corporation Plasma processing apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5578524A (en) * 1978-12-10 1980-06-13 Shunpei Yamazaki Manufacture of semiconductor device
JPS5628637A (en) * 1979-08-16 1981-03-20 Shunpei Yamazaki Film making method
JPS5772317A (en) * 1980-10-24 1982-05-06 Semiconductor Energy Lab Co Ltd Manufacture of covering film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5578524A (en) * 1978-12-10 1980-06-13 Shunpei Yamazaki Manufacture of semiconductor device
JPS5628637A (en) * 1979-08-16 1981-03-20 Shunpei Yamazaki Film making method
JPS5772317A (en) * 1980-10-24 1982-05-06 Semiconductor Energy Lab Co Ltd Manufacture of covering film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5326404A (en) * 1991-12-19 1994-07-05 Sony Corporation Plasma processing apparatus
JPH0620971A (ja) * 1992-06-30 1994-01-28 Canon Inc 堆積膜形成方法、光起電力素子、及び光起電力素子の連続的製造方法

Also Published As

Publication number Publication date
JPH0522375B2 (en:Method) 1993-03-29

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